-
J. Schäfer, J. Krügener, H. Genath, M. Rosebrock, M.A. Schubert, B. Min, C. Hollemann, R. Peibst
(2024):
Nickel oxidized by firing on poly-Si as recombination layer & hole-selective contact in perovskite/silicon tandem solar cells,
14th International Conference on Crystalline Silicon Photovoltaics (SiliconPV), Chambery, France, 15. - 19.04.2024
-
R. Clausing, J. Vollbrecht, R. Peibst, J. Krügener, A. Liu
(2024):
Perovskite and silicon - also a good match without inter-poisoning?,
tandemPV International Workshop, Amsterdam, Netherlands, 25. - 27.06.2024
-
C. Margenfeld, L. Peters, C. Ronning, J. Krügener, J. Hartmann, A. Waag
(2023):
Engineering the High-Temperature Annealing Process of Aluminium Nitride by Ion Implantation,
14th International Conference on Nitride Semiconductors (ICNS14), Fukuoka, Japan, 12. - 17.11.2023
-
H. Genath, J. Krügener, H.-J. Osten
(2023):
Growth of Nd₂O₃ layers on germanium-rich, (111)-oriented SiGe layers,
International Conference on Silicon Epitaxy and Heterostructures (ICS) / International SiGe Technology and Device Meeting (ISTDM) 2023, Como, Italy, 21. - 25.05.2023
-
L. Salomon, G. Wetzel, J. Krügener, R. Peibst
(2023):
Vehicle-Integrated Photovoltaics: Challenges on Electronics for Maximum Power Output,
The Eighth International Workshop on Power Supply on Chip (PwrSoC), Hannover, Germany, 27. - 29.09.2023
-
L. Salomon, R. Peibst, M. Rienäcker, J. Krügener
(2023):
Optimisation of Photolithographic Fabrication of Photonic Crystals on Rough Wafers for High Efficiency Solar Cells,
13th International Conference on Crystalline Silicon Photovoltaics (13th SiliconPV), Delft, The Netherlands, 11. - 14.04.2023
-
M. Rienäcker, J. Maksimovic, Y. Larionova, S. Hock Ng, T. Katkus, T. Pinedo Rivera, M. Stuiber, J. Krügener, F. Haase, R. Brendel, S. John, S. Juodkazis, R. Peibst
(2023):
Integration of photonic crystals in highly efficient POLO²-IBC cells – interplay between structural, optical and electrical properties,
13th International Conference on Crystalline Silicon Photovoltaics (13th SiliconPV), Delft, The Netherlands, 11. - 14.04.2023
-
U. Singh, H. Genath, R. Sarkar, J. Krügener, H.J. Osten, A. Laha
(2023):
All Epitaxy Nd2O3/AlGaN/GaN MOSHEMT on semi-insulating (0001) 4H-SiC: Increased thermal stability at 473 K,
14th International Conference on Nitride Semiconductors (ICNS14), Fukuoka, Japan, 12. - 17.11.2023
-
C. Margenfeld, L. Peters, J. Krügener, C. Ronning, A. Waag
(2022):
Enhancing Dislocation Annihilation in High-Temperature-Annealed AlN Templates by Ion Implantation,
International Workshop on Nitride Semiconductors (IWN2022), Berlin, Germany, 09.-14.10.2022
-
G. Wetzel, L. Salomon, J. Krügener, R. Peibst
(2022):
Assessment of required MPPT speed based on measured transient irradiance and dynamic electrical modelling for VIPV applications,
33rd International Photovoltaic Science and Engineering Conference (PVSEC-33), Nagoya, Japan, 13.-17.11.2022
-
H. Genath, H.-J. Osten
(2022):
Pseudomorphically Strained Ge Layers on (111)-oriented Virtual Si1-xGex Substrates,
LNQE Nanoday 2022, Hannover, Germany, 22.09.2022
-
H. Genath, J. Norberg, B. Wolpensinger, H. J. Osten
(2022):
Analysis of thin germanium-rich SiGe layers on Si(111) substrates,
International Conference on the Physics of Semiconductors 2022, Sydney, Australia, 27.06.-30.06.2022
-
H. Genath, J. Norberg, B. Wolpensinger, H.-J. Osten
(2022):
Investigation of the temperature stability of germanium-rich SiGe layers on Si(111) substrates,
LNQE Nanoday 2022, Hannover, Germany, 22.09.2022
-
L. Peters, C. Margenfeld, H. Spende, J. Krügener, C. Ronning, A. Waag
(2022):
A Combination of Ion Implantation and High-Temperature Annealing: The Origin of the 265 nm Absorption in AlN,
International Workshop on Nitride Semiconductors (IWN2022), Berlin, Germany, 09.-14.10.2022
-
L. Salomon, J. Krügener, R. Peibst
(2022):
Photolithographic fabrication of photonic crystals on monocrystalline silicon,
LNQE Nanoday 2022, Hannover, Germany, 22.09.2022
-
G. Wetzel, J. Krügener, B. Stannowski, S. Janke, R. Peibst
(2021):
Transient Electrical Characteristics of Hetero Junction Solar Cells under Fast Transient Illumination,
11th International Conference on Crystalline Silicon Photovoltaics (11th SiliconPV), online event, 19. - 23.04.2021
-
G. Wetzel, J. Krügener, R. Peibst
(2021):
From basic studies of transient shading effects to test drives with a PV-equipped light commercial vehicle,
38th European Photovoltaic Solar Energy Conference and Exhibition (38th EUPVSEC), online event, 06. - 10.09.2021
-
H. Genath, Y. Barnscheidt, H. J. Osten
(2021):
Epitaxy of Gd2O3 layers on virtual SiGe substrates on Si(111),
German MBE Workshop 2021, online event, 14. - 15.10.2021
-
J. Krügener, M. Rienäcker, S. Schäfer, M. Sanchez, S. Wolter, R. Brendel, S. John, H.-J. Osten, R. Peibst
(2021):
Towards 28 % Efficient Si Single Junction Solar Cells with Photonic Crystals,
11th International Conference on Crystalline Silicon Photovoltaics (11th SiliconPV), online event, 19. - 23.04.2021
-
J. Norberg, H. Genath, H. J. Osten
(2021):
Investigation of the temperature stability of germanium-rich SiGe layers on Si(111) substrates,
German MBE Workshop 2021, online event, 14. - 15.10.2021
-
M. Rienäcker, Y. Larionova, J. Krügener, S. Wolter, R. Brendel, R. Peibst
(2021):
Rear side dielectrics on interdigitating p + -(i)-n + back-contact solar cells - hydrogenation vs. charge effects,
38th European Photovoltaic Solar Energy Conference and Exhibition (38th EUPVSEC), online event, 26. 30.09.2021
-
R. Peibst, H. Fischer, M. Brunner, A. Schiessel, S. Wöhe, R. Wecker, F. Haase, H. Schulte-Huxel, S. Blankemeyer, M. Köntges, C. Hollemann, R. Brendel, G. Wetzel, J. Krügener, H. Nonnenmacher, H. Mehlich, A. Salavei, K. Ding, A. Lambertz, B. Pieters, S. Janke, B. Stannowski, L. Korte
(2021):
Demonstration of feeding VIPV converted energy into the high voltage on board network of practical light commercial vehicles for range extension,
38th European Photovoltaic Solar Energy Conference and Exhibition (38th EUPVSEC), online event, 06. - 10.09.2021
-
G. Wetzel, J. Krügener, R. Peibst
(2020):
For VIPV applications: Investigation of transient shading with high time resolution under different environmental conditions,
30th Photovoltaic Science and Engineering Conference (PVSEC-30), Jeju, South Korea, 08.-13.11.2020
-
J. Krügener, G. Wetzel, C. Hollemann, F. Haase, R. Peibst, H.-J. Osten
(2020):
Optimization of Doping Profiles in IBC pin Layout using Poly-Si-based Passivating Contacts,
30th Photovoltaic Science and Engineering Conference (PVSEC-30), Jeju, South Korea, 08.-13.11.2020
-
A. Fissel
(2019):
Thermodynamics and kinetics of nanocluster formation on semiconductor surfaces,
21st International Conference on Materials, Methods and Technologies, Burgas, Bulgaria, 01.-05.07.2019.
-
A. Fissel (invited)
(2019):
Thermodynamics and kinetics of nanocluster formation on semiconductor surfaces: the example of Si on SiC(0001),
XXth International Workshop on the Physics of Semiconductor Devices (IWPSD 2019), Kolkata, India, 17. - 20.12.2019
-
F. Haase, C. Hollemann, S. Schäfer, J. Krügener, R. Brendel, R. Peibst
(2019):
Transferring the record p-type Si POLO-IBC cell technology towards an industrial level,
46th Photovoltaic Specialists Conference (46th IEEE PVSC), Chicago, USA, 16. - 22.06.2019
-
G. Wetzel, J. Krügener, R. Peibst, A. Dietrich, B. Nacke, H. J. Osten
(2019):
Simulation of solar cell performance based on in the field measured ambience parameters,
9th International Conference on Silicon Photovoltaics (9th SiliconPV), Leuven, Belgium, 08. - 10.04.2019
-
H. Genath, J. Schmidt, H.J. Osten
(2019):
Carbon-mediated Epitaxy of Germanium-rich SiGe Layers on Si(111) Substrates,
LNQE Nanoday 2019, Hannover, Germany, 10.10.2019
-
J. Krügener, F. Haase, C. Hollemann, H.-J. Osten, R. Peibst
(2019):
Dopant diffusion through pinholes and continuous oxide layers in n-type polysilicon on oxide (POLO) passivating contacts,
29th Photovoltaic Science and Engineering Conference (PVSEC-29), Xi'an, China, 04.-08.11.2019
-
J. Krügener, F. Haase, C. Hollemann, R. Peibst, U. Höhne, J.-D. Kähler, H.-J. Osten
(2019):
Surface passivation of in situ doped n-type polysilicon on oxide (POLO) layers for silicon solar cells,
29th Photovoltaic Science and Engineering Conference (PVSEC-29), Xi'an, China, 04.-08.11.2019
DOI:
10.13140/RG.2.2.23832.75529
-
P. Gribisch, A. Fissel
(2019):
Tuning of morphology and crystal structure of Gd2O3 grown on Si(001),
XXth International Workshop on the Physics of Semiconductor Devices (IWPSD 2019), Kolkata, India, 17.-20.12.2019
-
P. Gribisch, A. R. Chaudhuri, A. Fissel
(2019):
Growth and dielectric properties of monoclinic Gd2O3 on Si(001),
2nd Joint ISTDM / ICSI 2019 Conference, Madison, USA, 02.-06.06.2019
DOI:
10.1149/09301.0057ecst
-
S. Schäfer, F. Haase, C. Hollemann, J. Hensen, J. Krügener, R. Brendel, R. Peibst
(2019):
26%-Efficient and 2 cm Narrow Interdigitated Back Contact Silicon Solar Cells with Passivated Slits on Two Edges,
9th International Conference on Silicon Photovoltaics (9th SiliconPV), Leuven, Belgium, 08.-10.04.2019
-
Y. Barnscheidt, H. J. Osten
(2019):
Carbon-Modified-Germanium-Epitaxy: Filtering Threading Dislocations with Carbon Delta Layers,
2nd Joint ISTDM / ICSI 2019 Conference, Madison, USA, 02.-06.06.2019
-
Y. Barnscheidt, J. Schmidt, and H. J. Osten
(2019):
Grazing Incidence X-Ray Diffraction Analysis of the Periodic Dislocation Network of Ge/Si Heterostructures,
2019 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN), Monterey, USA, 02.-04.04.2019
DOI:
10.1149/09301.0067ecst
-
A. Grimm, J. Ruhkopf, E. Bugiel, T. Wietler
(2018):
Epitaxial Gd2O3 as surface domain indicator: Towards single domain Ge films grown on Si by surfactant-mediated epitaxy,
German MBE Workshop 2018, Freiburg, Germany, 11.-12.10.2018
-
C. Klamt, V. Krausse, M. Rienäcker, F. Haase, J. Krügener, N. Folchert, R. Brendel, R. Peibst
(2018):
Intrinsic poly-crystalline silicon region in between the p+ and n+ POLO contacts of an 26.1%-efficient IBC solar cell,
35th European PV Solar Energy Conference and Exhibition (35th EU PVSEC), Brussels, Belgium, 24.-28.09.2018
-
F. Haase, C. Klamt, S. Schäfer, A. Merkle, M. Rienäcker, J. Krügener, R. Brendel, R. Peibst
(2018):
Laser Contact Openings for Local Poly-Si-Metal Contacts,
8th International Conference on Silicon Photovoltaics (8th SiliconPV), Lausanne, Switzerland, 19.-21.03.2018
-
J. Krügener
(2018):
The way towards high efficiency silicon-based solar cells,
IEEE Bombay Section, Indian Institute of Technolgoy Bombay, Mumbai, Indien, 8. November 2018
-
J. Krügener, F. Haase, R. Peibst, H. J. Osten (invited)
(2018):
Ion implantation for photovoltaic applications: Review and outlook for silicon solar cells,
12th Ion Implantation and other Applications of Ions and Electrons 2018 (ION2018), Kazimierz Dolny, Poland, 18.-21.06.2018
-
J. Krügener, F. Kiefer, R. Peibst, H. J. Osten
(2018):
Ion implantation of As, B, P, BF and BF2 on planar and alkaline-textured Si(001) surfaces for photovoltaic applications,
22nd International Conference on Ion Implantation Technology (IIT), Würzburg, Germany, 16.-21.09.2018
DOI:
10.1109/IIT.2018.8807962
-
J. Schmidt, D. Tetzlaff, T. F. Wietler, H. J. Osten
(2018):
Carbon-mediated epitaxy of SiGe virtual substrates on Si(001),
1st Joint ISTDM / ICSI 2018 Conference, Potsdam, Germany, 27.-31.05.2018
-
K. R. Khiangte, J. S. Rathore, J. Schmidt, H. J. Osten, A. Laha, S. Mahapatra
(2018):
Molecular beam epitaxy of wafer-scale all-epitaxial GeSn-on-insulator on Si(111),
20th International Conference on Molecular Beam Epitaxy (ICMBE 2018) Shanghai, China, 02.-07.09.2018
-
L. Montañez, I. Strauß, J. Caro, H. J. Osten
(2018):
Effect of interface states in thin films of metal organic frameworks obtained by the spray-coating method,
XXVIII. International Conference on Organometallic Chemistry (ICOMC2018), Florence, Italy, 15-20.07.2018
-
L. Montañez, I. Strauß, J. Caro, H.J. Osten
(2018):
Impact of border traps in p-Si/Cu3(BTC)2/Al based MIS capacitors,
EMN Meeting on Metal-Organic Frameworks, Barcelona, Spain, 10.-14.09.2018
-
P. Gribisch, J. Schmidt, H. J. Osten, A. Fissel
(2018):
Influence of Gd2O3 nanostructure formation on crystal structure and surface morphology during growth on Si(001),
German MBE Workshop 2018, Freiburg, Germany, 11.-12.10.2018
-
R. Peibst, N. Folchert, F. Haase, C. Klamt, Y. Larionova, J. Krügener, A. Merkle, B. Min, M. Rienäcker, U. Römer, S. Schäfer, D. Tetzlaff, T. Wietler, R. Brendel (invited)
(2018):
In-depth Study of poly-Si/Oxide/c-Si Junctions and p+ poly-Si/n+ Poly-Si Tunneling Junctions for Applications in Si Single Junction and Si-Based Tandem Cells,
MRS Fall Metting 2018, Boston, USA, 25.-30.11.2018
-
T. Wietler, D. Tetzlaff, A. Feldhoff, Y. Larionova, M. Turcu, S. Reiter, B. Min, R. Brendel, R. Peibst
(2018):
Formation of a Resistive SiOx Layer at the Interface of Poly-Si to Aluminum-Doped Zinc Oxide,
8th International Conference on Silicon Photovoltaics (8th SiliconPV), Lausanne, Switzerland, 19.-21.03.2018
-
Y. Barnscheidt, J. Schmidt, G. Wetzel, D. Tetzlaff, T. Wietler, H. J. Osten
(2018):
Highly Boron Doped Germanium grown by Carbon-Mediated-Epitaxy,
1st Joint ISTDM / ICSI 2018 Conference, Potsdam, Germany, 27.-31.05.2018
-
Y. Barnscheidt, J. Schmidt, G. Wetzel, D. Tetzlaff, T.F. Wietler, H. J. Osten
(2018):
Highly boron-doped germanium layers on Si(001) grown by carbon-mediated epitaxy,
Summer school on defects in semiconductors, Gent, Belgium, 10.-14.09.2018
-
Y. Barnscheidt, J. Schmidt, G. Wetzel, D. Tetzlaff, T.F. Wietler, H. J. Osten
(2018):
Ultra-high boron-doped Ge grown by carbon-mediated epitaxy,
German MBE Workshop 2018, Freiburg, Germany, 11.-12.10.2018
-
D. Tetzlaff, J. Krügener, Y. Larionova, S. Reiter, M. Turcu, F. Haase, R. Brendel, R. Peibst, U. Höhne, J.-D. Kähler, T. F. Wietler
(2017):
A Simple Method for Pinhole Detection in Carrier Selective POLO-Junctions for High Efficiency Silicon Solar Cells,
7th International Conference on Silicon Photovoltaics (7th SiliconPV), Freiburg, Germany, 03.-05.04.2017
-
D. Tetzlaff, J. Krügener, Y. Larionova, S. Reiter, M. Turcu, F. Haase, R. Brendel, R. Peibst, U. Höhne, J.-D. Kähler, T. Wietler
(2017):
Junction Unchained - Pinhole Detection in Carrier-Selective POLO-Junctions,
LNQE Nanoday 2017, Hannover, Germany, 28.09.2017
-
D. Tetzlaff, M. Dzinnik, J. Krügener, Y. Larionova, S. Reiter, M. Turcu, R. Peibst, U. Höhne, J.-D. Kähler, T. F. Wietler
(2017):
Introducing Pinhole Magnification by Selective Etching: Application to Poly-Si on Ultra-Thin Silicon Oxide Films,
7th International Conference on Silicon Photovoltaics (7th SiliconPV), Freiburg, Germany, 03.-05.04.2017
-
D. Tetzlaff, M. Dzinnik, J. Krügener, Y. Larionova, S. Reiter, M. Turcu, R. Peibst, U. Höhne, J.-d. Kähler, T. Wietler
(2017):
Tetramethylammoniumhydroxide - Pinhole Magnification by Selective Etching,
LNQE Nanoday 2017, Hannover, Germany, 28.09.2017
-
F. Haase, S. Schäfer, F. Kiefer, J. Krügener, R. Brendel, R. Peibst
(2017):
Perimeter recombination of 25 %-efficient IBC solar cells with passivating POLO contacts for both polarities,
44th Photovoltaic Specialists Conference (44th IEEE PVSC), Washington, D.C., USA, 22.-30.06.2017
-
H. S. Laine, V. Vähänissi, Z. Liu, E. Magana, A. E. Morishige, J. Krügener, K. Salo, B. Lai, H. Salvin, D. P. Fenning
(2017):
Toward Effective Gettering in Boron-Implanted Silicon Solar Cells,
44th Photovoltaic Specialists Conference (44th IEEE PVSC), Washington, D.C., USA, 22.-30.06.2017
-
H. S. Laine, V. Vähänissi, Z. Liu, E. Magaña, J. Krügener, A. E. Morishige, K. Salo, B. Lai, H. Savin and D. P. Fenning
(2017):
Unified model for iron gettering in boron- and phosphorus-implanted silicon,
Gettering and Defect Engineering in Semiconductor Technology 2017 (GADEST2017), Lopota Resort, Georgia, 01.-06.10.2017
-
J. Krügener, F. Haase, M. Rienäcker, R. Brendel, R. Peibst, H. J. Osten
(2017):
Improvement of the SRH Bulk Lifetime upon Formation of n-Type POLO Junctions for 25% Efficient Si Solar Cells,
LNQE Nanoday 2017, Hannover, Germany, 28.09.2017
-
J. Krügener, F. Haase, M. Rienäcker, R. Brendel, R. Peibst, H.-J. Osten
(2017):
Improvement of the SRH Bulk Lifetime upon Formation of n-Type POLO Junctions for 25% Efficient Si Solar Cells,
7th International Conference on Silicon Photovoltaics (7th SiliconPV), Freiburg, Germany, 03.-05.04.2017
-
J. Schmidt, D. Tetzlaff, H. J. Osten
(2017):
Carbon-mediated epitaxy of SiGe virtual substrates on Si(001),
Austrian MBE Workshop 2017, Vienna, Austria, 28.-29.09.2017
-
L. M. Montanez Huaman, I. Strauß, J. Caro, H. J. Osten
(2017):
Application of thin Cu3(BTC)2 films in MOS devices,
2nd European Conference on Metal Organic Frameworks and Porous Polymers, Delft, The Netherlands, 29.10.-01.11.2017
-
L. Montañez, I. Strauß, J. Caro, H. J. Osten
(2017):
Electronic properties of Cu3(BTC)2 based MOS capacitors,
LNQE Nanoday 2017, Hannover, Germany, 28.09.2017
-
R. Peibst, S. Reiter, Y. Larionova, R.-R. Koch, R. Brendel, D. Tetzlaff, J. Krügener, T. Wietler, U. Höhne, J.-D. Kähler, H. Mehlich
(2017):
Building blocks for industrial, screen-printed two sides-contacted POLO cells with highly transparent ZnO:Al layers,
33rd European PV Solar Energy Conference and Exhibition (33rd EU PVSEC), Amsterdam, The Netherlands, 25.-29.09.2017
-
S. Schäfer, F. Haase, C. Klamt, C. Kruse, F. Kiefer, J. Krügener, R. Brendel, R. Peibst
(2017):
IBC solar cells with passivating POLO contacts for both polarities – revisiting optical losses,
8th workshop on back contact solar cell and module technology, Freiburg, Germany, 21.-22.11.2017
-
A. Fissel, J. Krügener, P. Gribisch, S. Herbers, A. R. Chaudhuri (invited)
(2016):
Si twinning superlattices on atomically flat mesas: Epitaxial growth and electrical characterization,
2016 Collaborative Conference on 3D and Materials Research (CC3DMR), Incheon/Seoul, South Korea, 20.-24.06.2016
-
A. Joseph, D. Tetzlaff, J. Schmidt, R. Böttger, T.F. Wietler, H.J. Osten
(2016):
Properties of high-dose nitrogen implanted epitaxially grown Gd2O3 on silicon,
EMN Meeting on Epitaxy, Budapest, Hungary, 04.-08.09.2016
-
A. Joseph, D. Tetzlaff, J. Schmidt, R. Böttger, T.F. Wietler, H.J. Osten
(2016):
Properties of high-dose nitrogen implanted epitaxially grown Gd2O3 on silicon,
Deutscher MBE-Workshop, Garching, Germany, 13.-14.10.2016
-
D. Muñoz, P.J. Ribeyron, S. Harrison, C. Allebé, A. Descoeudres, M. Despeisse, C. Reichel, S.W. Glunz, R. Peibst, A. Merkle, O. Nielsen, I. Martín, V. Mihailetchi, T. Söderström, B. Demaurex, S. de Wolf, H. Mehlich, J. Zhao, J. Alvarez, J. Dupuis, E. Macron, B. de Gier, M. Tallián, F. Korsós, L. Korte
(2016):
Status of the EU FP7 HERCULES Project: What Is the Potential of n-Type Silicon Solar Cells in Europe?,
32nd European PV Solar Energy Conference and Exhibition (32nd EU PVSEC), Munich, Germany, 20.-24.06.2016
DOI:
10.4229/EUPVSEC20162016-2BO.3.6
-
D. Tetzlaff, J. Krügener, Y. Larionova, S. Reiter, M. Turcu, R. Peibst, U. Höhne, J.-D. Kähler, T. Wietler
(2016):
Evolution of Oxide Disruptions: The (W)hole Story About Passivating Contacts,
43rd Photovoltaic Specialists Conference (43rd IEEE PVSC), Portland, OR, USA, 05.-10.06.2016
DOI:
10.1109/PVSC.2016.7749582
-
D. Tetzlaff, J. Krügener, Y. Larionova, S. Reiter, M. Turcu, R. Peibst, U. Höhne, J.-D. Kähler, T. Wietler
(2016):
Finding Pinholes in Carrier Selective Polycrystalline Si / Crystalline Si Contacts,
16th European Microscopy Conference, Lyon, france, 28.08.-02.09.2016
-
F. Haase, F. Kiefer, J. Krügener, R. Brendel, R. Peibst
(2016):
IBC solar cells with polycrystalline on oxide (POLO) passivating contacts for both polarities,
26th International Photovoltaic Science and Engineering Conference (PVSEC-26), Singapore, 24.-28.10.2016
-
H. Genath, J. Schmidt, D. Tetzlaff, K. Gosh, A. Laha, and H.J. Osten
(2016):
Epitaxy of Gd2O3 Layers on Virtual GaN Substrates,
LNQE Nanoday 2016, Hannover, Germany, 29.09.2016
-
H. Schulte-Huxel, F. Kiefer, S. Blankemeyer, R. Witteck, M. Vogt, M. Köntges, R. Brendel, J. Krügener, R. Peibst
(2016):
Flip-Flop Cell Interconnection Enabled by an Extremely High Bifaciality of Screen-Printed Ion Implanted N-PERT Si Solar Cells,
32nd European PV Solar Energy Conference and Exhibition (32nd EU PVSEC), Munich, Germany, 20.-24.06.2016
-
J. Krügener, D. Tetzlaff, Y. Larionova, Y. Barnscheidt, S. Reiter, M. Turcu, R. Peibst, J.-D. Kähler, T. Wietler
(2016):
Electrical deactivation of boron in p+-poly/SiOx/crystalline silicon passivating contacts for silicon solar cells,
21st International Conference on Ion Implantation Technology (IIT), Tainan, Taiwan, 26.-30.09.2016
DOI:
10.1109/IIT.2016.7882868
-
J. Krügener, F. Kiefer, M. Rienäcker, F. Haase, R. Peibst, H.J. Osten
(2016):
Ion implantation for photovoltaic applications: Review and outlook for n-type silicon solar cells,
21st International Conference on Ion Implantation Technology (IIT), Tainan, Taiwan, 26.-30.09.2016
DOI:
10.1109/IIT.2016.7882886
-
J. Krügener, F. Kiefer, R. Peibst, H.J. Osten
(2016):
Comparison of experimental emitter saturation current densities and simulated defect densities of boron-implanted emitters,
21st International Conference on Ion Implantation Technology (IIT), Tainan, Taiwan, 26.-30.09.2016
DOI:
10.1109/IIT.2016.7882856
-
J. Krügener, Y. Larionova, B. Wolpensinger, D. Tetzlaff, S. Reiter, M. Turcu, R. Peibst, J.-D. Kähler, T. Wietler
(2016):
Dopant diffusion from p+-poly-Si into c-Si during thermal annealing,
43rd Photovoltaic Specialists Conference (43rd IEEE PVSC), Portland, OR, USA, 05.-10.06.2016
DOI:
10.1109/PVSC.2016.7750083
-
J. Schmidt, M. Eilert, S. Peters, T. F. Wietler
(2016):
Characterization of Thin Si1-xGex Layers on Si(001) by Spectroscopic Ellipsometry for Ge Fractions from 0 to 100%,
7th International Conference on Spectroscopic Ellipsometry, Berlin, Germany, 06.-10.06.2016
-
J.-D. Kähler, U. Höhne, J.J. Haase, D. Tetzlaff, J. Krügener, T. Wietler, Y. Larionova, S. Reiter, M. Turcu, R. Brendel, R. Peibst
(2016):
Low pressure chemical vapour deposition for in situ doped n+ POLO junctions in industrial silicon solar cells,
26th International Photovoltaic Science and Engineering Conference (PVSEC-26), Singapore, 24.-28.10.2016
-
L. Montañez, J. A. Tofflinger, R. Grieseler, P. Fischer, A. Ben-Or, J. A. Guerra, R. Weingartner. H. J. Osten, A. Kribus
(2016):
Structural, optical, and interface properties of sputtered AlN thin films under different hydrogen dilution conditions,
Extended Defects in Semiconductors (EDS 2016), Les Issambres, France, 25.-29.09.2016
-
M. Rienäcker, A. Merkle, U. Römer, H. Kohlenberg, J. Krügener, R. Brendel, R. Peibst
(2016):
Recombination behavior of photolithography-free back junction back contact solar cells with carrier-selective polysilicon on oxide junctions for both polarities,
6th International Conference on Silicon Photovoltaics (6th SiliconPV), Chambéry, France, 07.-09.03.2016
-
M. Rienäcker, M. Bossmeyer, A. Merkle, U. Römer, J. Krügener, R. Brendel, R. Peibst
(2016):
Junction Resistivity of Carrier-Selective Polycrystalline / Crystalline Silicon Junctions and Its Impact on the Solar Cell Performance,
43rd Photovoltaic Specialists Conference (43rd IEEE PVSC), Portland, OR, USA, 05.-10.06.2016
-
R. Brendel, M. Rienäcker, R. Peibst
(2016):
A Quantitative Measure for the Carrier Selectivity of Contacts to Solar Cells,
32nd European PV Solar Energy Conference and Exhibition (32nd EU PVSEC), Munich, Germany, 20.-24.06.2016
DOI:
10.4229/EUPVSEC20162016-2CO.4.1
-
R. Peibst, U. Römer, Y. Larionova, M. Rienäcker, A. Merkle, N. Folchert, S. Reiter, M. Turcu, B. Min, J. Krügener, D. Tetzlaff, E. Bugiel, T. Wietler, R. Brendel
(2016):
Working Principle of Carrier Selective Poly-Si/c-Si Junctions: Is Tunneling the Whole Story?,
6th International Conference on Silicon Photovoltaics (6th SiliconPV), Chambéry, France, 07.-09.03.2016
-
R. Peibst, Y. Larionova, S. Reiter, M. Turcu, R. Brendel, D. Tetzlaff, J. Krügener, T. Wietler, U. Höhne, J.-D. Kähler, H. Mehlich, S. Frigge
(2016):
Implementation of n+ and p+ poly-Si/c-Si junctions on front and rear side of double-side contacted industrial silicon solar cells,
32nd European PV Solar Energy Conference and Exhibition (32nd EU PVSEC), Munich, Germany, 20.-24.06.2016
DOI:
10.4229/EUPVSEC20162016-2BO.3.2
-
S. Reiter, N. Koper, R. Reineke-Koch, Y. Larionova, M. Turcu, J. Krügener, D. Tetzlaff, T. Wietler, U. Höhne, J.-D. Kähler, R. Brendel, R. Peibst
(2016):
Parasitic Absorption In Polycrystalline Si-Layers For Carrier-Selective Front Junctions,
6th International Conference on Silicon Photovoltaics (6th SiliconPV), Chambéry, France, 07.-09.03.2016
-
Y. Larionova, R. Peibst, M. Turcu, S. Reiter, R. Brendel, D. Tetzlaff, J. Krügener, T. Wietler, U. Höhne, J.-D. Kähler
(2016):
Optimization of p+ poly-Si / c-Si junctions on wet-chemically grown interfacial oxides and on different wafer morphologies,
32nd European PV Solar Energy Conference and Exhibition (32nd EU PVSEC), Munich, Germany, 20.-24.06.2016
DOI:
10.4229/EUPVSEC20162016-2CO.4.3
-
A. Grimm, A. Fissel, E. Bugiel, H. J. Osten and T. F. Wietler
(2015):
In situ observation of low temperature growth of Ge on Si(111) via RHEED,
International Workshop on SPA-LEED, Hannover, Germany, 28.05.-29.05.2015
-
A. Grimm, A. Fissel, E. Bugiel, H. J. Osten und T. F. Wietler (keynote talk)
(2015):
In situ observation of low temperature growth of Ge on Si(111) via RHEED,
Fifth european conference on crystal growth (eccg5), Bologna, Italy, 09.-11.09.2015
-
A. Grimm, A. Katiyar, S. K. Ray, H. J. Osten and T. F. Wietler
(2015):
Room Temperature Photoluminescence of Strained Ge-layers,
Engineering of Functional Interfaces (EnFI), Hannover, Germany, 06.-07.07.2015
-
A. Grimm, L. C. Kähler, and T. F. Wietler
(2015):
Surface preparation of virtual Germanium substrates on Si(001),
Deutscher MBE-Workshop, Paderborn, Germany, 21.-22.09.2015
-
A. Grimm, L. C. Kähler, T. F. Wietler
(2015):
Surface preparation of virtual Germanium substrates on Si(001),
LNQE Nanoday 2015, Hannover, Germany, 01.10.2015
-
A. R. Chaudhuri (invited)
(2015):
Tuning dielectric properties of epitaxial Lanthanide oxides on Si by defect passivation,
Materials Research Society (MRS) Fall Meeting, Boston, USA, 29.11.-04.12.2015
-
A. R. Chaudhuri, H. J. Osten und A. Fissel
(2015):
Impact of boron on the step-free area formation during molecular beam epitaxial growth on MESA structures on Si(111),
Fifth european conference on crystal growth (eccg5), Bologna, Italy, 09.-11.09.2015
-
A.Fissel (invited)
(2015):
Thermodynamics and kinetics of nanocluster formation on semiconductor surfaces,
Collaborative Conference on Crystal Growth (3CG 2015), Hong Kong, China, 14.-17.12.2015
-
E. Köhnen, J. Krügener, and H.J. Osten
(2015):
Surface passivation of ion implanted, Al2O3-passivated p+ emitters,
LNQE Nanoday 2015, Hannover, Germany, 01.10.2015
-
J. Krügener, R. Peibst, E. Bugiel, D. Tetzlaff, F. Kiefer, M. Jestremski, R. Brendel, H.-J. Osten
(2015):
Ion Implantation of Boric Molecules for Silicon Solar Cells,
5th International Conference on Crystalline Silicon Photovoltaics (5th SiliconPV), Konstanz, Germany, 23.03.-25.03.2015
-
J. Schmidt, D. Tetzlaff, E. Bugiel and T. F. Wietler
(2015):
Strained Ge layers on virtual Si1-xGex(001) substrates,
Engineering of Functional Interfaces (EnFI), Hannover, Germany, 06.07.-07.06.2015
-
J. Schmidt, D. Tetzlaff, E. Bugiel, and T. F. Wietler
(2015):
Strained Ge layers on virtual Si1-xGex(001) substrates,
Fifth european conference on crystal growth (eccg5), Bologna, Italy, 09.-11.09.2015
-
J. Schmidt, M. Eilert and T. F. Wietler
(2015):
Characterization of Si1-xGex layers on Si(001) substrates by spectroscopic ellipsometry,
LNQE Nanoday 2015, Hannover, Germany, 01.10.2015
-
J. Werner, S.-J. Moon, P. Löper, A. Walter, M. Filipic, C.-H. Weng, L. Löfgren, J. Bailat, M. Topic, M. Morales Masis, R. Peibst, R. Brendel, S. Nicolay, S. de Wolf, B. Niesen, C. Ballif
(2015):
Towards ultra-high efficient photovoltaics with perovskite/crystalline silicon tandem devices,
31st European PV Solar Energy Conference and Exhibition (31st EU PVSEC), Hamburg, Germany, 14.-18.09.2015
DOI:
10.4229/EUPVSEC20152015-1AP.1.3
-
M. Eberstein, K. Reinhardt, S. Körner, F. Kiefer, R. Peibst
(2015):
Glass phase alignment in front side pastes for P- and N-type solar cells,
Semiconductor Technology International Conference (CSTIC), Shanghai, China, 15.-16.03.2015
DOI:
10.1109/CSTIC.2015.7153489
-
M. Möllers, C. Margenfeld, D. Schwendt, E. Bugiel, T. F. Wietler, and H. J. Osten
(2015):
Non-cubic Gd2O3 on Silicon (111) Substrates,
LNQE Nanoday 2015, Hannover, Germany, 01.10.2015
-
M. Möllers, C. Margenfeld, D. Schwendt, E. Bugiel, T. F. Wietler, and H. J. Osten
(2015):
Non-cubic Gd2O3 on Silicon (111) Substrates,
Deutscher MBE-Workshop, Paderborn, Germany, 21.-22.09.2015
-
R. Brendel, T. Dullweber, R. Peibst, C. Kranz, A. Merkle, D. Walter
(2015):
Breakdown of the Efficiency Gap to 29% Based on Experimental Input Data and Modelling,
31st European PV Solar Energy Conference and Exhibition (31st EU PVSEC), Hamburg, Germany, 14.-18.09.2015
DOI:
10.4229/EUPVSEC20152015-2BP.1.2
-
T. Dullweber, C. Kranz, R. Peibst, U. Baumann, H. Hannebauer, A. Fülle, S. Steckemetz, T. Weber, M. Kutzer, M. Müller, G. Fischer, P. Palinginis, D. H. Neuhaus
(2015):
The PERC+ Cell: a 21%-Efficient Industrial Bifacial PERC Solar Cell,
31st European PV Solar Energy Conference and Exhibition (31st EU PVSEC), Hamburg, Germany, 14.-18.09.2015
DOI:
10.4229/EUPVSEC20152015-2BO.4.3
-
T. F. Wietler, E. Bugiel, and K. R. Hofmann
(2015):
How to get rid of the Sb in Surfactant-mediated Epitaxy of relaxed Germanium films on Silicon (001)?,
9th International Conference on Silicon Epitaxy and Heterostructures (ICSI 9), Montreal, Kanada, 17.-22.05.2015
-
A. Fissel (invited)
(2014):
Impact of Surface Phase Coexistence on the Development of Step-free Areas on Si(111),
Collaborative Conference on Crystal Growth (3CG 2014), Phuket, Thailand, 04.-07.11.2014
-
A. Fissel, A. R. Chaudhuri, J. Krügener, H.-J. Osten
(2014):
Influence of “1×1” – (7×7) phase transition on step-free area formation in molecular beam epitaxial growth of Si on Si(111),
18th International Conference on Molecular Beam Epitaxy (MBE 2014), Flagstaff, Arizona, USA, 07.-12.09.2014
-
A. Grimm, A. Katiyar, S. K. Ray, H.-J. Osten, T. F. Wietler
(2014):
Room Temperature PL of strained Ge-layers,
NanoDay 2014, Hannover, Germany, 01.10.2014
-
A. Laha, A. Fissel, H.-J. Osten
(2014):
Semiconductor/Oxide Heterostructures on Silicon for Future Complementary Metal Oxide Semiconductor (CMOS) Devices and Beyond,
European Workshop on Heterostructure Technology - HETECH 2014, Giessen, Germany, 12.-15.10.2014
-
A. Merkle, R. Peibst, R. Brendel
(2014):
High Efficient Fully Ion-Implanted, Co-Annealed and Laser-Structured Back Junction Back Contacted Solar Cells,
29th European PV Solar Energy Conference and Exhibition (29th EU PVSEC), Amsterdam, Netherlands, 22.-26.09.2014
DOI:
10.4229/EUPVSEC20142014-2AV.2.61
-
A. R. Chaudhuri, A. Fissel, H.-J. Osten
(2014):
Template assisted growth and dielectric properties of Gd2O3 thin films on Si(100),
E-MRS 2014 Spring Meeting, Lille, France, 26.-30.05.2014
-
C. Margenfeld
(2014):
Thermally induced phase change of rare earth oxides,
Deutscher MBE-Workshop, Darmstadt, Germany, 15.-16.09.2014
-
D. Tetzlaff
(2014):
Influence of growth temperature on strain relaxation of thin Ge films on Si(001) grown by carbon-mediated epitaxy,
Deutscher MBE-Workshop, Darmstadt, Germany, 15.-16.09.2014
-
F. Kiefer, R. Peibst, T. Ohrdes, J. Krügener, H.-J. Osten, R. Brendel
(2014):
Emitter Recombination Current Densities of Boron Emitters with Silver/Aluminum Pastes,
40th IEEE Photovoltaic Specialists Conference (PVSC-40), Denver, Colorado, 08.-13.06.2014
DOI:
10.1109/PVSC.2014.6925514
-
H.-J. Osten (invited), D. Schwendt, A. R. Chaudhuri, A. Fissel, P. Shekhter, M. Eizenberg
(2014):
Tuning Dielectric Properties of Epitaxial Lanthanide Oxides on Silicon,
225th Electrochemical Society Meeting, Orlando, Florida, USA, 11.-15.05.2014
-
J. Krügener
(2014):
Structural investigations of textured silicon after ion implantation,
52. Treffen der Nutzergruppe Ionenimplantation, Dresden, Germany, 13.11.2014
-
J. Krügener, E. Bugiel, R. Peibst, F. Kiefer, T. Ohrdes, R. Brendel, H.-J. Osten
(2014):
Structural Investigation of Ion Implantation of Boron on Random Pyramid Textured Si(100) for Photovoltaic Applications,
20th International Conference on Ion Implantation Technology (IIT), Portland, Oregon, USA, 26.06.-04.07.2014
DOI:
10.1109/IIT.2014.6940060
-
J. Krügener, R. Peibst, E. Bugiel, F. Kiefer, R. Brendel, H.J. Osten
(2014):
Ion implantation of elemental boron and boric molecules for silicon solar cells,
LNQE Nanoday 2014, Hannover, Germany, 01.10.2014
-
J. Schmidt
(2014):
Strained Ge layers on virtual Si1-xGex(001) substrates,
Deutscher MBE-Workshop, Darmstadt, Germany, 15.-16.09.2014
-
J. Schmidt, M. Möllers, D. Tetzlaff, E. Bugiel, T. F. Wietler
(2014):
Defect analysis of virtual SME-SiGe substrates on Si(001) by transmission electron microscopy,
NanoDay 2014, Hannover, Germany, 01.10.2014
-
K. Ghosh, S. Das, A. Fissel, H.-J. Osten, A. Laha
(2014):
Long term reliability study of epitaxial neodymium-gadolinium oxides (NGO) on Si substrates for future group IV based CMOS devices,
E-MRS 2014 Spring Meeting, Lille, France, 26.-30.05.2014
-
K. Katiyar, A. Grimm, A. Rakesh, R. Bar, T. Wietler, H.-J. Osten, S. K. Ray
(2014):
Optical Emission Characteristics of Compressively Strained Ge Films,
Photonics 2014: 12th International Conference on Fiber Optics and Photonics, Kharagpur, India, 13.-16.12.2014
-
K. Takhar, M. Biswas, D. Tetzlaff, T. Wietler, H.-J. Osten, A. Laha
(2014):
Monolithic integration of high performance germanium (Ge) based infrared photodetector on silicon and Ge on insulator (GeOI) substrates,
E-MRS 2014 Spring Meeting, Lille, France, 26.-30.05.2014
-
P. Shekhter, A. R. Chaudhuri, A. Laha, S. Yehezkel, A. Shriki, H.-J. Osten, M. Eizenberg
(2014):
The influence of carbon doping on the electric behavior of Gd2O3 as high-k gate dielectric,
AVS 61th International Symposium and Exhibition, Baltimore, Maryland, USA, 09.-14.11.2014
-
R. Peibst, U. Römer, Y. Larionova, H. Schulte-Huxel, T. Ohrdes, M. Haberle, B. Lim, J. Krügener, D. Stichtenoth, T. Wütherich, C. Schöllhorn, J. Graff, R. Brendel
(2014):
Building blocks for back-junction back-contacted cells and modules with ion-implanted poly-Si junctions,
40th IEEE Photovoltaic Specialist Conference (PVSC), Denver, Colorado, USA, 08.-13.06.2014
DOI:
10.1109/PVSC.2014.6925049
-
S. Körner, F. Kiefer, R. Peibst, F. Heinemeyer, J. Krügener, and M. Eberstein
(2014):
Basic Study on the Influence of Glass Composition and Aluminum Content on the Ag/Al Paste Contact Formation to Boron Emitters,
5th Workshop on Metallization for Crystalline Silicon Solar Cells, Constance, Germany, 20.-21.10.2014
-
T. Ohrdes, R. Peibst, N.-P. Harder, P. P. Altermatt, R. Brendel
(2014):
Unified View on the Recombination-Induced Short-Circuit Current Losses in Solar Cells with High-Low Junctions,
29th European PV Solar Energy Conference and Exhibition (29th EU PVSEC), Amsterdam, Netherlands, 22.-26.09.2014
DOI:
10.4229/EUPVSEC20142014-2BV.8.27
-
U. Römer, A. Merkle, R. Peibst, T. Ohrdes, B. Lim, J. Krügener, R. Brendel
(2014):
Ion-implanted Poly-Si / c-Si Junctions as a Back-surface Field in Back-Junction Back-Contacted Solar Cells,
29th European PV Solar Energy Conference and Exhibition (29th EU PVSEC), Amsterdam, Netherlands, 22.-26.09.2014
DOI:
10.4229/EUPVSEC20142014-2AV.3.61
-
Y. Larinova, F. Kiefer, B. Lim, F. Heinemeyer, R. Peibst, R. Brendel, M. Emsley, C. Dube, J. Graff
(2014):
Industrial ion implanted, co-annealed and fully screen-printed bifacial n-PERT solar cells with low-doped back-surface fields,
4th nPV workshop, 's-Hertogenbosch, Netherlands, 27.-28.03.2014
-
A. Fissel
(2013):
Thermodynamics and kinetics of nanocluster formation on semiconductor surfaces,
21st International Conference on Composites or Nano Engineering ICCE-21, Tenerife, Spain, 21.-27.07.2013
-
A. Fissel, J. Krügener, H.-J. Osten
(2013):
Impact of surface phase transformation on the epitaxial growth of Si on Si(111),
17th International Conference on Crystal Growth and Epitaxy (ICCGE-17), Warzaw, Poland, 11.-16.08.2013
-
A. Grimm
(2013):
In-situ Untersuchung des epitaktischen Wachstums von Ge auf Si(111) mit RHEED,
Deutscher MBE-Workshop, Dresden, Germany, 30.09.-01.10.2013
-
A. R. Chaudhuri, A. Fissel, H.-J. Osten
(2013):
Enhanced Dielectric Properties of Nitrogen Doped Epitaxial Gd2O3 Thin Films on Si,
E-MRS 2013 Fall Meeting, Warzaw, Poland, 16.-20.09.2013
-
A. R. Chaudhuri, A. Fissel, H.-J. Osten
(2013):
Improving Dielectric Properties of Epitaxial Gd2O3 Thin Films on Si by Dopant Incorporation,
30th North American Conference on Molecular Beam Epitaxy (NAMBE 2013), Banff, Alberta, Canada, 05.-11.10.2013
-
A. R. Chaudhuri, A. Fissel, H.-J. Osten
(2013):
Enhanced Dielectric Properties of Nitrogen Doped Epitaxial Gd2O3 Thin Films on Si,
NanoDay 2013, Hannover, Germany, 10.10.2013
-
D. Schwendt, P. Shekhter, M. Eizenberg, H.-J. Osten
(2013):
Tuning the properties of rare-earth oxides for advanced nano-electronic applications,
First Conference of Scientific Cooperation between Lower Saxony and Israel, Hannover, Germany, 06.-07.10.2013
-
D. Tetzlaff
(2013):
Kohlenstoff-unterstützte Epitaxie von Germanium auf Silizium,
Vakuumtag, Hannover, Germany, 09.10.2013
-
D. Tetzlaff, T. F. Wietler, E. Bugiel, H.-J. Osten
(2013):
Carbon-mediated Epitaxy of Ge on Si,
NanoDay 2013, Hannover, Germany, 10.10.2013
-
D. Tetzlaff, T. F. Wietler, E. Bugiel, H.-J. Osten
(2013):
Influence of growth temperature on strain relaxation of thin Ge films on Si(001) grown by carbon-mediated epitaxy,
8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8), Fukuoka, Japan, 02.-06.06.2013
-
E. Bugiel, F. Schulze Wischeler
(2013):
Transmissionselektronenmikroskopie am LNQE: Neue Angebote an diagnostischen Möglichkeiten,
LNQE-Kolloquium, Hannover, Germany, 16.01.2013
-
F. Dross, A. Merkle, E. van Kerschaver, S. Baker-Finch, K. Cabanas-Holmen, R. Peibst, N.-P. Harder, R. Brendel, P. A. Basore
(2013):
Analysis of RISE-IBC Solar Cells,
28th European PV Solar Energy Conference and Exhibition (28th EU PVSEC), Paris, France, 30.09.-04.10.2013
DOI:
10.4229/28thEUPVSEC2013-2CV.3.48
-
F. Kiefer, R. Peibst, T. Ohrdes, T. Dullweber, J. Krügener, H.-J. Osten, C. Schöllhorn, A. Grohe, R. Brendel
(2013):
Analyzing the recombination current densities in industrial like n-type PERT solar cells exceeding 20% efficiency,
Photovoltaic Science and Engineering Conference (PVSEC-23), Taipeh, Taiwan, 28.10.-01.11.2013
-
H.-J. Osten
(2013):
Forschungsaktivitäten am MBE Institut,
Vakuumtag, Hannover, Germany, 09.10.2013
-
H.-J. Osten
(2013):
Elektronik: gestern - heute - morgen,
VDI AK Mikroelektronik, Mikro- und Feinwerktechnik, Hannover, Germany, 09.10.2013
-
H.-J. Osten (invited)
(2013):
Improving Dielectric Properties of Epitaxial Lanthanide Oxides on Silicon,
AVS 60th International Symposium and Exhibition, Long Beach, California, USA, 27.10.-01.11.2013
-
J. Krügener, F. A. Wolf, R. Peibst, F. Kiefer, C. Schöllhorn, A. Grohe, R. Brendel, H.-J. Osten
(2013):
Correlation of dislocation line densities and emitter saturation current densities of ion implanted boron emitters,
Photovoltaic Science and Engineering Conference (PVSEC-23), Taipeh, Taiwan, 28.10.-01.11.2013
-
J. Krügener, N.-P. Harder
(2013):
Weak Light Performance of PERC, PERT and Standard Industrial Solar Cells,
3rd SiliconPV, Hamelin, Germany, 24.-27.03.2013
-
J. Schmidt
(2013):
Epitaxie von Germanium auf virtuellen SiGe(001)-Substraten,
Deutscher MBE-Workshop, Dresden, Germany, 30.09.-01.10.2013
-
J. Schmidt, D. Tetzlaff, E. Bugiel, T. F. Wietler
(2013):
Epitaxy of germanium on virtual Si1-xGex(001) substrates,
NanoDay 2013, Hannover, Germany, 10.10.2013
-
R. Bar, S. Manna, A. Laha, H.-J. Osten, S. K. Ray
(2013):
Si1-xGex Nanocrystals Embedded in Epitaxial Gd2O3 on p-Si (111) Grown by Molecular Beam Epitaxy for Nanocrystal Based Flash Memory Devices,
International Union of Materials Research Societies – International Conference in Asia – 2013 (IUMRS-ICA-2013), Bangalore, India, 16.-20.12.2013
-
R. Brendel, T. Dullweber, R. Gogolin, H. Hannebauer, N.-P. Harder, J. Hensen, S. Kajari-Schröder, R. Peibst, J. H. Petermann, U. Römer, J. Schmidt, H. Schulte-Huxel, V. Steckenreiter
(2013):
Recent Progress and Options for Future Crystalline Silicon Solar Cells,
28th European PV Solar Energy Conference and Exhibition (28th EU PVSEC), Paris, France, 30.09.-04.10.2013
DOI:
10.4229/28thEUPVSEC2013-2BP.1.1
-
R. Peibst, N.-P. Harder, A. Merkle, T. Neubert, S. Kirstein, J. Schmidt, F. Dross, P. A. Basore, R. Brendel
(2013):
High-Efficiency RISE-IBC Solar Cells: Influence of Rear Side-Passivation on pn-Junction Meander Recombination,
28th European PV Solar Energy Conference and Exhibition (28th EU PVSEC), Paris, France, 30.09.-04.10.2013
DOI:
10.4229/28thEUPVSEC2013-2CO.4.1
-
T. F. Wietler, J. Schmidt, D. Tetzlaff, E. Bugiel
(2013):
Surfactant-Mediated Epitaxy of Silicon-Germanium Films on Silicon (001) Substrates,
8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8), Fukuoka, Japan, 02.-06.06.2013
-
A. Fissel (invited tutorial)
(2012):
Semiconductor Epitaxy: From Science to Nanotechnology,
International Conference on Emerging Electronics (ICEE), Mumbai, India, 15.-17.12.2012
-
A. Fissel, J. Krügener, H.-J. Osten
(2012):
Preparation of large step-free mesas on Si(111) by molecular beam epitaxy,
E-MRS 2012 Spring Meeting, Symposium A: Advanced Silicon Materials Research for Electronic and Photovoltaic Applications, Strasbourg, France, 14.-18.05.2012
-
A. Laha, E. Bugiel, A. Fissel, H.-J. Osten
(2012):
Encapsulated solid phase epitaxy of Ge quantum well embedded into epitaxial rare earth oxide,
17th International Conference on Molecular Beam Epitaxy, Nara, Japan, 23.-28.09.2012
-
D. Schwendt
(2012):
Spannungseffekte in dünnen, epitaktischen Seltene Erden-Oxiden,
Deutscher MBE-Workshop, Hannover, Germany, 11.-12.09.2012
-
D. Schwendt
(2012):
Röntgendiffraktometrie an dünnen epitaktischen Schichten,
Bruker XRD Anwendertreffen, Lüneburg, Germany, 09.-10.10.2012
-
D. Schwendt, H.-J. Osten
(2012):
Influence of strain on dielectric properties of rare earth oxides,
17th Workshop on Dielectrics in Microelectronics (WoDiM 2012), Dresden, Germany, 25.-27.06.2012
-
D. Tetzlaff
(2012):
Untersuchung der Relaxation bei der Kohlenstoff-unterstützten Epitaxie von Ge auf Si,
Deutscher MBE-Workshop, Hannover, Germany, 11.-12.09.2012
-
D. Tetzlaff , T. F. Wietler, E. Bugiel, H.-J. Osten
(2012):
Strain relaxation of thin Ge films on Si(001) grown by carbon-mediated epitaxy,
17th International Conference on Molecular Beam Epitaxy, Nara, Japan, 23.-28.09.2012
-
H.-J. Osten
(2012):
Epitaxial Oxides on Silicon for CMOS and Beyond,
Indian Institute of Technology Hyderabad, Hyderabad, India, 13.12.2012
-
H.-J. Osten (invited)
(2012):
Strain-driven enhancement of dielectric properties in thin metal oxides layers epitaxially grown on silicon,
International Conference on Emerging Electronics (ICEE), Mumbai, India, 15.-17.12.2012
-
H.-J. Osten (invited), D. Schwendt
(2012):
Strain Effects on Dielectric Properties of Thin, Crystalline Rare Earth Oxides on Silicon,
222th Electrochemical Society Meeting, Honolulu, Hawaii, USA, 07.-12.10.2012
-
H.-J. Osten, T. Wietler
(2012):
Materialien und Bauelemente für zukünftige Si-basierte Elektronik,
LNQE-Kolloquium, Hannover, Germany, 05.12.2012
-
J. Krügener
(2012):
MBE-Wachstum und Charakterisierung von Silizium mit modifizierter Kristallstruktur,
Deutscher MBE-Workshop, Hannover, Germany, 11.-12.09.2012
-
T. F. Wietler, E. P. Rugeramigabo, E. Bugiel, E. Garralaga Rojas
(2012):
Relaxed Germanium on Porous Silicon Substrates,
2012 International Silicon-Germanium Technology and Device Meeting (ISTDM), Berkeley, California, USA, 04.-06.06.2012
-
T. Ohrdes, U. Römer, Y. Larionova, R. Peibst, P. P. Altermatt, N.-P. Harder
(2012):
High Fill-Factors of Back-Junction Solar Cells without Front Surface Field Diffusion,
27th European PV Solar Energy Conference and Exhibition (29th EU PVSEC), Frankfurt, Germany, 24.-29.09.2012
DOI:
10.4229/27thEUPVSEC2012-2DO.3.5
-
A. Grimm, D. Schwendt, H.-J. Osten
(2011):
Structural investigation of epitaxial high-k gate dielectrics,
Deutscher MBE-Workshop 2011, Berlin, Germany, 05.-06.10.2011
-
A. Laha, A. Bin, P. R. P. Babu, A. Fissel, H.-J. Osten
(2011):
Enhanced electrical properties of carbon doped epitaxial Gd2O3 thin films on silicon substrates,
220th Electrochemical Society Meeting, Boston (MA), USA, 09.-14.10.2011
-
D. Schwendt, H.-J. Osten
(2011):
Photoelectron spectroscpoy of ultrathin epitaxial rare earth oxides on silicon,
Frühjahrstagung der Deutschen Physikalischen Gesellschaft, Dresden, Germany, 13.-18.03.2011
-
D. Tetzlaff , T. Wietler, E. Bugiel, H.-J. Osten
(2011):
Carbon-Mediated Growth of Epitaxial Germanium Layers on Silicon,
7th International Conference on Si Epitaxy and Heterostructures (ICSI 7), Leuven, Belgium, 28.08.-01.09.2011
-
D. Tetzlaff, T. Wietler, E. Bugiel, H.-J. Osten
(2011):
Ge-Epitaxie für NIR-Fotodetektoren,
NanoDay 2011, Hannover, Germany, 29.09.2011
-
D. Tetzlaff, T. Wietler, E. Bugiel, H.-J. Osten
(2011):
Kohlenstoffunterstütztes Wachstum von epitaktischen Germaniumschichten auf Silizium,
Deutscher MBE-Workshop 2011, Berlin, Germany, 05.-06.10.2011
-
H.-J. Osten (invited)
(2011):
Epitaxial Oxides on Silicon for CMOS and Beyond,
38th Conference on the Physics & Chemistry of Surfaces & Interfaces (PCSI), San Diego, California, USA, 16.-20.01.2011
-
H.-J. Osten (invited)
(2011):
Epitaxial Lanthanide Oxides on Silicon for CMOS and Beyond,
7th International Conference on Si Epitaxy and Heterostructures (ICSI 7), Leuven, Belgium, 28.08.-01.09.2011
-
J. Krügener, A. Fissel, H.-J. Osten
(2011):
Formation of large step-free areas on silicon,
Deutscher MBE-Workshop 2011, Berlin, Germany, 05.-06.10.2011
-
J. Ruhkopf, T. F. Wietler, E. P. Rugeramigabo, D. Tetzlaff, J. Krügener, E. Bugiel, H.-J. Osten
(2011):
Surfactant-mediated epitaxy of germanium layers on vicinal silicon substrates,
Frühjahrstagung der Deutschen Physikalischen Gesellschaft, Dresden, Germany, 13.-18.03.2011
-
T. F. Wietler, J. Ruhkopf, E. P. Rugeramigabo, D. Tetzlaff, J. Krügener, E. Bugiel, H.-J. Osten
(2011):
Surfactant-Mediated Epitaxy of Germanium on Vicinal Silicon Substrates,
7th International Conference on Si Epitaxy and Heterostructures (ICSI 7), Leuven, Belgium, 28.08.-01.09.2011
-
T. F. Wietler, J. Ruhkopf, E. P. Rugeramigabo, D. Tetzlaff, J. Krügener, E. Bugiel, H.-J. Osten
(2011):
Surfactant-modifizierte Epitaxie von Germanium auf fehlgeneigten Siliziumsubstraten,
Deutscher MBE-Workshop 2011, Berlin, Germany, 05.-06.10.2011
-
T. Wietler (invited)
(2011):
Surfactant-modified epitaxy of germanium layers on silicon for high-mobility channels,
16th European Molecular Beam Epitaxy Workshop, Alpe d'Huez, France, 20.-23.03.2011
-
A. Fissel, J. Kruegener, H.-J. Osten
(2010):
Towards controlled molecular beam epitaxial growth of artificially layered Si structures,
16th International Conference on Molecular Beam Epitaxy (MBE2010), 2010, Berlin, Germany, 22.–27.08.2010
-
A. Laha, A. Fissel, H.-J. Osten
(2010):
Impact of interfacial germanium on the properties of molecular beam epitaxial grown Gd2O3 on Si,
16th International Conference on Molecular Beam Epitaxy (MBE2010), 2010, Berlin, Germany, 22.–27.08.2010
-
A. Laha, A. Fissel, H.-J. Osten
(2010):
Growth of graphite-like carbon on Si(111) substrates using solid source molecular beam epitaxy technique,
16th International Conference on Molecular Beam Epitaxy (MBE2010), 2010, Berlin, Germany, 22.–27.08.2010
-
A. Laha, E. Bugiel, H.-J. Osten, A. Fissel, V. V . Afanas’ev, M. Badylevich
(2010):
Semiconductor Nanostructures in Crystalline Rare Earth Oxide for Nanoelectronic Device Applications,
22nd International Conference on Microelectronics (ICM2010), 2010, Cairo, Egypt, 19.-22.12.2010
DOI:
10.1109/ICM.2010.5696129
-
A. Laha, E. Bugiel, H.-J. Osten, A. Fissel, V. V. Afanas'ev, M. Badylevich
(2010):
Incorporating Si, Ge and Si1-xGex Nanostructures into Crystalline Rare Earth Oxide for Nanoelectronic Device Applications,
E-MRS Fall Meeting 2010, Symp. E: Nanoscaled Si, Ge based materials, Warsaw, Poland, 13.-17.09.2010
-
D. Müller-Sajak, H. Pfnür, A. Cosceev, K. R. Hofmann
(2010):
Crystalline lattice-matched B 0.7Sr0.3O on Si(001) as Gate Dielectric,
Electronic Materials Conference, Notre-Dame, Indiana, USA, 23.-25.06.2010
-
D. Schwendt, E. Bugiel, H.-J. Osten
(2010):
Tuning the Properties of Crystalline Lanthanide Oxides on Silicon,
International Symposium on Integrated Functionalities (ISIF) 2010, San Juan, Puerto Rico, 13.-16.06.2010
-
H.-J. Osten (invited)
(2010):
Challenges on Large Scale Use of QNM Technologies,
Panel discussion at the 4th International Conference on Quantum, Nano and Micro Technologies (ICQNM 2010), Sint Maarten, Netherlands Antilles, 10.-16.02.2010
-
H.-J. Osten (invited)
(2010):
Introducing Crystalline Rare-Earth Oxides into Si-based Electronics,
International Symposium on Integrated Functionalities (ISIF) 2010, San Juan, Puerto Rico, 13.-16.06.2010
-
H.-J. Osten, A. Laha, A. Fissel
(2010):
Si Nanostructures Embedded into Crystalline Rare-Earth Oxide Matrix for Opto and Nano Electronic Applications,
4th International Conference on Quantum, Nano and Micro Technologies (ICQNM 2010), Sint Maarten, Netherlands Antilles, 10.-16.02.2010
-
J. Krügener, H.-J. Osten, A. Fissel
(2010):
Influence of Surface Preparation Conditions on the Surface Defect Structure of Boron-covered Si(111): An Ultraviolet Photoelectron Spectroscopy Study,
37th Conference on the Physics and Chemistry of Surfaces and Interfaces (PCSI), Santa Fe, New Mexico, USA, 10.-14.01.2010
-
J. S. de Sousa, R. Peibst, K. R. Hofmann, G. A. Farias, J.-P. Leburton
(2010):
Electron charging and discharging in Ge nanocrystal flash memories; one by one,
International Conference on Superlattices, Nanostructures and Nanodevices (ICSNN-2010), Beijing, China, 18.-23.07.2010
-
R. Endres, H. Gottlob, M. Schmidt, D. Schwendt, H.-J. Osten, U. Schwalke
(2010):
Crystalline Gadolinium Oxide: A Promising High-k Candidate for Future CMOS Generations,
218th ECS Meeting, Las Vegas, Nevada, USA, 10.-15.10.2010
-
R. Ranjith, A. Laha, E. Bugiel, H.-J. Osten
(2010):
Growth and studies of ultra thin Gd2O3 layers and Gd2O3/Si/Gd2O3 stacking on p-Si(111) wafers by molecular beam epitaxy for resonant tunnel diode applications,
16th International Conference on Molecular Beam Epitaxy (MBE2010), 2010, Berlin, Germany, 22.–27.08.2010
-
T. F. Wietler, E. P. Rugeramigabo, E. Bugiel, K. R. Hofmann
(2010):
Strain Relaxation Engineering in Epitaxy of Ge on Si(001): The Impact of Sb-Coverage on Interdiffusion,
16th International Conference on Molecular Beam Epitaxy (MBE2010), 2010, Berlin, Germany, 22.–27.08.2010
-
T. F. Wietler, P. Turewicz, E. P. Rugeramigabo, D. Schwendt, D. Tetzlaff, E. Bugiel, K. R. Hofmann
(2010):
P-type Ge films on Si(001) grown by surfactant-mediated epitaxy,
International SiGe Technology and Device Meeting, Stockholm, Sweden, 24.-26.05.2010
-
A. Cosceev, D. Müller-Sajak, H. Pfnür, K. R. Hofmann
(2009):
Preparation and Electrical Characterization of Amorphous BaO, SrO and Ba0.7Sr0.3O as High-k Gate Dielectrics,
12th International Conference on the Formation of Semiconductor Interfaces" (ICFSI-12), Weimar, Germany, 05.-10.07.2009
-
A. Fissel, A. Laha, E. Bugiel, R. Dargis, A. Ali, H. J. Osten
(2009):
Tailoring of Si nanostructures embedded into epitaxial oxides for various applications,
17th International Conference on Composites/Nano Engineering (ICCE-17), Honolulu, USA, 26.07.-01.08.2009
-
A. Fissel, A. Laha, E. Bugiel, R. Dargis, A. Ali, H.-J. Osten
(2009):
Preparation and Properties of Si nanostructures embedded into epitaxial oxides,
Nanotech Europe 2009, Berlin, Germany, 28.-30.09.2009
-
A. Fissel, J. Krügener, D. Schwendt, H.-J. Osten
(2009):
Role of boron and surface defects on the growth mode of Si on Si(111): A photoemission and electron diffraction study,
12th International Conference on the Formation of Semiconductor Interfaces (ICFSI-12), Weimar, Germany, 05.-10.07.2009
-
A. Fissel, R. Dargis, E. Bugiel, J. Krügener, T. Wietler, D. Schwendt, A. Laha, H.-J. Osten
(2009):
Single-crystalline silicon on single-crystalline insulator prepared by different approaches,
E-MRS 2009, Symposium I, Strasbourg, France, 08.-12.06.2009
-
A. Laha, E. Bugiel, A. Fissel, H.-J. Osten
(2009):
Epitaxial Gd2O3 on strained Si1-xGex layers: Growth and electrical characterization,
E-MRS 2009, Symposium I, Strasbourg, France, 08.-12.06.2009
-
A. Laha, M. Jestremski, E. Bugiel, D. Wong, A. Fissel, H.-J. Osten, Ashkar Ali, S. Datta
(2009):
Si Nanostructures Embedded into Crystalline Rare Earth Oxide Matrix for Opto and Nano-electronic Device Application,
2009 International Conference on Mechanical and Electronics Engineering (ICMEE), Chennai, India, 27.-29.06.2009
-
A. Laha, M. Jestremski, E. Bugiel, D. Wong, and H.-J. Osten, A. Fissel, A. Ali, S. Datta
(2009):
Quantum Effects in Group IV Nanostructures Embedded into Crystalline Rare Earth Oxides on Silicon Substrates,
International Conference on Materials for Advanced Technologies (ICMAT2009), Singapore, 28.06.-03.07.2009
-
A. N. Nazarov, V. S. Lysenko, Y. V.Gomeniuk, Y. Y.Gomeniuk, H.-J. Osten, A. Laha
(2009):
Interface and bulk properties of MBE-grown rare-earth metal oxides on silicon,
216th ECS Meeting, Wien, Austria, 04.-09.10.2009
-
D. Müller-Sajak, A. Cosceev, H. Pfnür, K. R. Hofmann
(2009):
Investigation of Epitaxy and Electrical Properties of the Alkaline-Earth Oxides BaO, SrO and Ba0.7Sr0.3O on Si(001) as Alternative Gate Dielectrics,
6th International Conference on Silicon Epitaxy and Heterostructures, ICSI-6, Los Angeles, USA, 17.-22.05.2009
-
D. Schwendt, D. Tetzlaff, E. Bugiel, H.-J. Osten
(2009):
Stability of Crystalline Gd2O3 Thin Films on Silicon during Post-growth Processing,
3rd International Conference on Signals, Circuits and Systems (SCS’09), Djerba, Tunesia, 06.-08.11.2009
-
H.-J. Osten (invited)
(2009):
Epitaxy of High-K Oxides,
15th Euro-MBE, Zakopane, Poland, 08.-11.03.2009
-
H.-J. Osten (invited)
(2009):
Introducing Crystalline Rare-Earth Oxides into Si-based Electronics,
XVth International Workshop on the Physics of Semiconductor Devices (XVth IWPSD), Delhi, India, 15.-19.12.2009
-
H.-J. Osten, A. Laha, A. Fissel (invited)
(2009):
Epitaxial Lanthanide Oxide based Gate Dielectrics,
MRS Spring Meeting, San Francisco, California, USA, 13.-17.04.2009
-
J. Wang, A. Laha, A. Fissel, D. Schwendt, R. Dargis, T. Watahiki, T. Liu, H.-J. Osten
(2009):
Structural Study of Epitaxially Grown Nano-thick Nd2O3/Si(111) Heterostructure,
4th IEEE Int. Conf. on Nano/Micro Engineered and Molecular Systems (IEEE-NEMS), Shenzhen, China, 05.-08.01.2009
-
K. R. Hofmann, A. Cosceev, D. Müller-Sajak, H. Pfnür
(2009):
Crystalline lattice-matched Ba0.7Sr0.3O on Si(001) as Gate Dielectric,
IEEE Semiconductor Interface Specialists Conference (SISC), Arlington, USA, 03.-05.12.2009
-
R. Dargis, A. Fissel, D. Schwedt, E. Bugiel, J. Krügener, T. Wietler, A. Laha, H.-J. Osten
(2009):
Epitaxial Growth of Silicon on Rare-Earth Metal oxide,
4th Symposium on Vacuum based Science and Technology, Koszalin-Kolobrzeg, Poland, 21.-23.09.2009
-
A. Fissel, J. Krügener, E. Bugiel, T. Block, H.-J. Osten
(2008):
Molecular beam epitaxial growth of Si on heavily boron-doped Si(111) surface: From initial stages to the growth of Si polytypes,
Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD) 2008, Sydney, Australia, 28.07.-01.08.2008
-
A. Laha, A. Fissel, E. Bugiel, M. Badylevich, V. Afanas'ev, H.-J. Osten
(2008):
Integration of low dimensional crystalline Si into functional epitaxial oxides for next generation solar cell application,
Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD) 2008, Sydney, Australia, 28.07.-01.08.2008
-
A. Laha, E. Bugiel, A. Fissel, H.-J. Osten
(2008):
Si-nanoclusters embedded into epitaxial rare earth oxides: potential candidate for non-volatile memory applications,
E-MRS Meeting 2008, Strasbourg, France, 27.-31.05.2008
-
A. Laha, E. Bugiel, R. Dargis, D. Schwendt, M. Badylevich, V. Afanasiev, A. Fissel, H.-J. Osten
(2008):
Integration of low dimensional crystalline Si into functional epitaxial oxides,
Workshop on Recent Advances of Low Dimensional Structures and Devices (WRA-LDSD) Nottingham, UK, 07.-09.04.2008
-
H.-J. Osten, A. Laha, E. Bugiel, A. Fissel
(2008):
Si Nanostructures Embedded into Epitaxial Gd2O3 on Si,
15th International Conference on Molecular Beam Epitaxy, Vancouver, Canada, 03.-08.08.2008
-
M. Badylevich, S. Shamuilia, V. V. Afanas’ev, A. Stesmans A. Laha, H.-J. Osten, A. Fissel
(2008):
Electronic structure of interfaces of cubic Gd2O3 with Si(111) and Si nano-clusters,
E-MRS Meeting 2008, Strasbourg, France, 27.-31.05.2008
-
M. C. Lemme, H. D. B. Gottlob, T. J. Echtermeyer, H. Kurz, R. Endres, U. Schwalke, M. Czernohorsky, H.-J. Osten
(2008):
CMOS Integration of Epitaxial Gd2O3,
5th Workshop on Dielectrics in Microelectronics (WoDiM), Bad Saarow, Germany, 23.-25.06.2008
-
M. Erenburg, R. Peibst, E. Bugiel, K. R. Hofmann
(2008):
Write and retention characteristics of electrons and holes in MOS field-effect transistors with Ge nanocrystal floating gate,
5th Workshop on Dielectrics in Microelectronics (WoDiM), Bad Saarow, Germany, 23.-25.06.2008
-
Q.-Q. Sun, A. Laha, H.-J. Osten, S.-J. Ding, D. W. Zhang, A. Fissel
(2008):
Electrical Characterization of Ultrathin Single Crystalline Gd2O3/Si(100) with Pt Top Electrode,
9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT 2008), Beijing, China, 20.-23.10.2008
-
R. Dargis, A. Fissel, E. Bugiel, T. Wietler, D. Schwendt, A. Laha, H.-J. Osten
(2008):
Development of multi-step procedure for epitaxial growth of crystalline silicon on rare-earth-metal oxide for SOI-applications,
14th International Conference on Solid Films and Surfaces (ICSFS), Dublin, 29.06.-04.07.2008
-
R. Peibst, T. Dürkop, E. Bugiel, N. Koo, T. Mollenhauer, M. C. Lemme, H. Kurz, K. R. Hofmann
(2008):
PECVD grown Ge nanocrystals embedded in SiO2: from disordered to templated self-organization,
15th International Conference on Superlattices, Nanostructures and Nanodevices (ICSNN 2008), Natal, Brazil, 03.-08.08.2008
-
T. F. Wietler, E. P. Rugeramigabo, E. Bugiel, K. R. Hofmann
(2008):
Influence of Sb induced surface faceting on misfit dislocation formation in Ge heteroepitaxy on Si(001),
29th International Conference on the Physics of Semiconductors (ICPS 2008), Rio de Janeiro, Brazil, 27.07.-01.08.2008
-
T. Wietler, A. Laha, E. Bugiel, M. Czernohorsky, R. Dargis, A. Fissel, H.-J. Osten
(2008):
Epitaxial growth of Gd2O3 on Ge films grown by surfactant-mediated epitaxy on Si(001) substrates,
4th International SiGe Technology and Device Meeting (ISTDM 2008), Taiwan, 11.-14.05.2008
-
A. Fissel, D. Kühne, E. Bugiel, A. Laha, M. Czernohorsky, R. Dargis, H.-J. Osten
(2007):
Silicon in functional epitaxial oxides: A new group of nanostructures,
The 6th International Conference on Low Dimensional Structures and Devices (LDSD), San Andres, Colombia, 15.-20.04.2007
-
A. Laha, A. Fissel, H.-J. Osten
(2007):
Engineering the interface between epitaxial lanthanide oxide thin films and Si substrates: A route towards tuning the electrical properties,
15th Conference on Insulating Films on Semiconductors (INFOS), Athens, Greece, 20.-23.06.2007
-
A. Laha, D. Kühne, E. Bugiel, A. Fissel, H.-J. Osten
(2007):
Confining single crystal Si-nanoclsuters into epitaxial rare earth oxides: Taking advantage of quantum phenomena to pratical applications,
IUMRS-ICAM, Bangalore, India, 08.-13.10.2007
-
A. N. Nazarov, Y. V. Gomeniuk, Y. Y. Gomeniuk, H. D. B. Gottlob, M. Schmidt, M. C. Lemme, M. Czernohorsky, H.-J. Osten
(2007):
Charge trapping in ultrathin Gd2O3 high-k dielectric,
15th Conference on Insulating Films on Semiconductors (INFOS), Athens, Greece, 20.-23.06.2007
-
B. Raissi, J. Piscator, O. Engström, S. Hall, O. Buiu, M. C. Lemme, H. D. B. Gottlob, P. K. Hurley, K. Cherkaoui, and H.-J. Osten
(2007):
High-K-oxide/silicon interfaces characterized by capacitance frequency spectroscopy,
37th European Solid-State Device Research Conference, München, Germany, 11.-13.09.2007
-
E. Bugiel, A. Fissel, H.J. Osten
(2007):
Integration of Functional Epitaxial Oxides into Silicon: A TEM Investigation,
Microscopy of Semiconducting Materials XV, Churchill College, Cambridge, UK, 02.-05. April 2007.
-
E. Bugiel, A. Fissel, M. Czernohorsky, A. Laha, H.-J. Osten (invited)
(2007):
Integration of Functional Epitaxial Oxides into Silicon: A TEM Investigation,
Microscopy Conference, Saarbrücken, 02.-07.09.2007
-
E. Lipp, M. Eizenberg, M. Czernohorsky, H.-J. Osten
(2007):
Thermal stability of Pt/Epitaxial Gd2O3/Si Stacks,
MRS Spring Meeting 2007, San Francisco, California, USA, 09.-13.04.2007
-
H.-J. Osten (invited)
(2007):
From high-K application to nanostructures: Integration of epitaxial gadolinium oxide into silicon,
5th International Conference on Silicon Epitaxy and Heterostructures (ICSI-5), Marseille, France 20.-24.05.2007
-
H.-J. Osten (invited)
(2007):
Crystalline Rare-Earth Oxides as High-k Materials for Future CMOS Technologies,
212th ECS Meeting, Washington, D.C., USA, 07.-12.10.2007
-
H.-J. Osten, D. Kühne, A. Laha, R. Dargis, M. Czernohorsky, E. Bugiel, A. Fissel (invited)
(2007):
Integration of Functional Epitaxial Oxides into Silicon: From High-K Application to Nanostructures,
Jahrestagung der Deutsche Physikalischen Gesellschaft, Regensburg, Germany, 25.-30.03.2007
-
H.-J. Osten, M. Czernohorsky, R. Dargis, A. Laha, D. Kühne, E. Bugiel, A. Fissel (invited)
(2007):
Integration of functional epitaxial oxides into silicon: From high-k application to nanostructures,
15th Conference on Insulating Films on Semiconductors (INFOS), Athens, Greece, 20.-23.06.2007
-
T. Dürkop, E. Bugiel, I. Costina, A. Ott, R. Peibst, K. R. Hofmann
(2007):
PE-CVD Fabrication of Germanium Nanoclusters for Memory Applications,
E-MRS 2007 Spring Meeting, Strasbourg, France, 28.05.-01.06.2007
-
T. F. Wietler, E. Bugiel, K. R. Hofmann
(2007):
Relaxed Germanium Films on Silicon(110),
5th International Conference on Silicon Epitaxy and Heterostructures (ICSI-5), Marseille, France 20.-24.05.2007
-
T. F. Wietler, E. Bugiel, K. R. Hofmann
(2007):
Tuning Strain Relaxation by Surface-Morphology: Surfactant-Mediated Epitaxy of Germanium on Si(100) and Si(111),
11th International Conference on the Formatin of Semiconductor Interfaces (ICFSI), Manaus, Brasil, 19.-24.08.2007
-
A. Fissel, C. R. Wang, E. Bugiel, and H.-J. Osten
(2006):
Preparation of twinning superlattices in silicon by atomic-scale surface manipulation: First step towards Si polytype growth,
24th North American Conference on Molecular Beam Epitaxy, Durham, North Carolina, USA, 08.-11.10.2006
-
A. Fissel, E. Bugiel, and H.-J. Osten
(2006):
Formation of Si twinning-superlattice: First Step towards Si polytype growth,
E-MRS 2006 Spring Meeting, Nice, France, 29.05.-02.06.2006
-
A. Fissel, M. Czernohorsky, H.-J. Osten
(2006):
Properties of crystalline rare-earth oxide high-k dielectrics grown by molecular beam epitaxy on silicon carbide,
E-MRS 2006 Spring Meeting, Nice, France, 29.05.-02.06.2006
-
A. Fissel, M. Czernohorsky, R. Dargis, H.-J. Osten
(2006):
Growth and Properties of Crystalline Gadolinium Oxide Dielectric Layers On Silicon Carbide for High-K Application,
6th European Conference on Silicon Carbide and Related Materials (ECSCRM), Newcastle upon Tyne, UK, 03.-07.09.2006
-
A. Laha, A. Fissel, E. Bugiel, H.-J. Osten
(2006):
Comparative Investigation of Epitaxial Gd2O3 Thin Films Grown on Si Substrates with Different Orientations for High-K Application,
48th Electronic Materials Conference, Pennsylvania State University, Pennsylvania, USA, 28.-30.06.2006
-
A. Laha, A. Fissel, E. Bugiel, O. Kirfel, H.-J. Osten
(2006):
Epitaxial multi-component rare earth oxide for high-K application,
E-MRS 2006 Spring Meeting, Nice, France, 29.05.-02.06.2006
-
D. Kühne, A. Fissel, E. Bugiel, H.-J. Osten
(2006):
Novel approach for fabrication of single crystalline insulator/Si/insulator double barrier nanostructures using cooperative vapour-solid-phase epitaxy,
MRS Spring Meeting 2006, San Francisco, California, USA, 18.-21.04.2006
-
D. Kühne, A. Fissel, E. Bugiel, H.-J. Osten
(2006):
Fabrication of single crystalline insulator/Si/insulator double barrier nanostructure using cooperative vapor-solid-phase epitaxy,
E-MRS 2006 Spring Meeting, Nice, France, 29.05.-02.06.2006
-
D. Kühne, E. Bugiel, A. Fissel, H.-J. Osten
(2006):
Novel Approach for Fabrication of Single Crystalline Insulator/Si/Insulator Nanostructures: Cooperative Vapour-Solid phase Epitaxy,
33rd Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI), Cocoa Beach, Florida, USA, 15.-19.01.2006
-
E. Bugiel, M. Lewerenz, H.-J. Osten
(2006):
Fabrication of well-defined individual dislocations in SiGe as a novel 1-dimensional system,
E-MRS 2006 Spring Meeting, Nice, France, 29.05.-02.06.2006
-
G. Krause, M. F. Beug, T. Müller, T. Mikolajick, K. R. Hofmann
(2006):
1/f Noise Analysis of a 75 nm Twin-Flash Technology Non-Volatile Memory Cell,
7th Non-Volatile Memory Technology Symposium, San Mateo, California, USA, 05.-08.11.2006
-
H.-J. Osten (invited)
(2006):
MBE growth and Properties of Crystalline Oxide/Silicon/Oxide Nanostructures,
ESF Exploratory Workshop, Como, Italy, 12.-13.09.2006
-
H.-J. Osten, A. Laha, A. Fissel
(2006):
Influence of Si substrate orientation on growth and electrical properties of epitaxial Gd2O3 thin films for high-κ application,
37th IEEE Semiconductor Interface Specialists Conference (SISC), San Diego, 06.-09.12.2006
-
H.-J. Osten, D. Kühne, A. Laha, M. Czernohorsky, E. Bugiel, A. Fissel
(2006):
Integration of functional epitaxial oxides into silicon: From high-k application to nanostructures,
24th North American Conference on Molecular Beam Epitaxy, Durham, North Carolina, USA, 08.-11.10.2006
-
H.-J. Osten, M. Czernohorsky, E. Bugiel, D. Kühne, A. Fissel
(2006):
Interface engineering during epitaxial growth of high-k lanthanide oxides on silicon,
MRS Spring Meeting 2006, San Francisco, California, USA, 18.-21.04.2006
-
H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, M. Schmidt, J.K. Evaki, T. Wahlbrink, M.C. Lemme, H. Kurz, R. Endres, Y. Stefanov, U. SChwalke, M. Czernohorsky, E. Bugiel, A. Fissel, H.J. Osten
(2006):
Approaches to CMOS integration of epitaxial gadolinium oxide high-K dielectrics,
36th European Solid-State Device Research Conference, Montreux, Switzerland, 18.-22. September 2006.
-
M. Czernohorsky, A. Fissel, H.-J. Osten
(2006):
Characterization of crystalline rare-earth oxide high-k dielectrics grown by molecular beam epitaxy on silicon carbide,
33rd Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI), Cocoa Beach, Florida, USA, 15.-19.01.2006
-
M. Czernohorsky, A. Fissel, R. Dargis, E. Bugiel, H.-J. Osten
(2006):
Wachstum von kristallinem Gadoliniumoxid auf Silicium,
Deutscher MBE Workshop, Hamburg, Germany, 26.-27.09.2006
-
O. Kerker, T. F. Wietler, K. R. Hofmann
(2006):
Characterization of HfO2 deposited by reactive sputtering as gate dielectric for epitaxial Ge-MOSFETs on Si wafers,
E-MRS 2006 Spring Meeting, Nice, France, 29.05.-02.06.2006
-
R. Dargis, A. Fissel, M. Czernohorsky, H.-J. Osten
(2006):
Epitaxie von Gadoliniumoxid auf Siliziumcarbid,
Deutscher MBE Workshop, Hamburg, Germany, 26.-27.09.2006
-
T. F. Wietler, E. Bugiel and K. R. Hofmann
(2006):
Residual strain in Ge films grown by surfactant-mediated epitaxy on Si(111) and Si(001) substrates,
E-MRS 2006 Spring Meeting, Nice, France, 29.05.-02.06.2006
-
T. F. Wietler, E. Bugiel, K. R. Hofmann
(2006):
Surfactant-mediated epitaxy of germanium on structured silicon substrates: towards embedded germanium,
28th International Conference on the Physics of Semiconductors (ICPS), Wien, Austria, 24.-28.07.2006
-
A. Fissel (invited):
(2005):
Manipulation der atomaren Anordnung mit Epitaxie – Ein Weg zur erweiterten Funktionalität von Halbleitermaterialien für nanoelektronische Anwendungen,
Kolloquiumsvortrag, Laboratorium für Nano- und Quantenengineering (LNQE), Hannover, 26.10.2005.
-
A. Fissel, O. Kirfel, Z. Elassar, E. Bugiel, M. Czernohorsky, H. J. Osten
(2005):
Interface formation during epitaxial growth of Neodymium Oxide on Si(001),
207th Electrochemical Society Meeting, Quebec (Canada), 15.-20.05.2005
-
E. Bugiel, H.J. Osten, A. Fissel, O. Kirfel, M. Czernohorsky
(2005):
TEM investigations of Epitaxial High-k Dielectrics on Silicon,
Microscopy of Semiconductor Materials (MSM) XIV Conference, Oxford (UK), 11.-14.04.2005
-
H.-J. Osten
(2005):
Interface formation during epitaxial growth of binary metal oxide on silicon,
NATO workshop Defects in High-K Materials, St. Petersburg, Russia, 11.-14.07.2005
-
H.-J. Osten (invited)
(2005):
Auf dem Weg zur Nanoelektronik,
EKompass Workshop, Hannover, Germany, 25.04.2005
-
H.-J. Osten (invited)
(2005):
MBE of rare earth oxides,
European Science Foundation, Exploratory Workshop, San Remo, Italy, 11.-13.05.2005
-
H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, J. Efavi, M. Schmidt, T. Wahlbrik, M.C. Lemme, H. Kurz, M. Czernohorsky, E. Bugiel, H.J. Osten, O. Kirfel, A. Fissel
(2005):
Crystalline Gd2O3 High-k Gate Dielectrics with TiN Capped Fully Silicided (FUSI) NiSi Electrodes,
36th IEEE Semiconductor Interface Specialists Conference (SISC), Arlington (USA), 01.-03.12.2005
-
K. R. Hofmann, T. F. Wietler, E. Bugiel, R. Kurps
(2005):
High Quality Germanium Films Grown Directly on Si(001) by Surfactant Mediated Epitaxy,
Electronic Materials Conference, University of California, Santa Barbara, California, USA, 22.-24.06.2005
-
M. Czernohorsky, O. Kirfel, Z. Elassar, E. Bugiel, A. Fissel, H.-J. Osten
(2005):
MBE Growth and Interface Formation of Neodymium Oxide on Silicon,
13th Euro-Konferenz Molecular Beam Epitaxy, Grindelwald, Switzerland, 07.-09.03.2005
-
M. F. Beug, R. Ferretti, K. R. Hofmann
(2005):
Polarity dependent generation of gate-side and substrate-side border traps in nitrided gate oxides,
Insulating Films on Semiconductors, INFOS 2005, Leuven, Belgium, 22.-24.06.2005
-
O. Aubel, W. Hasse, M. Hommel, H. Koerner
(2005):
Model for the barrier diffusion into Cu interconnects at high temperatures,
Materials for Advanced Metallization, MAM 2005, Dresden, Germany, 06.-09.03.2005
-
O. Kerker, J. Zachariae, F. Mirza, R. Ferretti, K. R. Hofmann
(2005):
Investigation of Electrical and Optical Properties of BaxSr1-xO Gate Oxide MIS Structures,
DPG-Frühjahrstagung, Berlin, Germany, 04.-09.03.2005
-
T. F. Wietler, E. Bugiel, K. R. Hofmann
(2005):
Surfactant Mediated Epitaxy of High-Quality Low-Doped Relaxed Germanium Films on Silicon (001),
Fourth International Conference on Silicon Epitaxy and Heterostructures, ICSI-4, Awaji Island, Hyogo, Japan, 23.-26.05.2005
-
A. Fissel (invited)
(2004):
Molecular Beam Epitaxy of semiconductor nanostructures based on SiC,
5th European Conference on Silicon Carbide and Related Materials (ECSCRM), Bologna (Italy), 31.08. – 04.09.2004
-
A. Fissel, C. Wang, E. Bugiel, H.-J. Osten
(2004):
Epitaxial growth of non-cubic silicon,
The 5th International Conference on Low Dimensional Structures and Devices (LDSD), Cancun, Mexico, 12.-17.12.2004
-
C. Deiter, A. Gerdes, E. P. Rugeramigabo, J. Wollschläger, C. R. Wang, B. H. Müller, K. R. Hofmann
(2004):
GIXRD and AFM Investigations of CaF2/Si Multilayers,
DPG-Frühjahrstagung, Regensburg, Germany, 08.-12.03.2004
-
C. R. Wang, B. H. Müller, M. Bierkandt, E. Bugiel, T. Wietler, K. R. Hofmann
(2004):
Growth of CaF2/Si/CaF2 Resonant-Tunneling Structures by B and Sb Surfactant-Enhanced Epitaxy,
E-MRS Spring Meeting, Strasbourg, France, 24.-28.05.2004
-
C. R. Wang, B. H. Müller, M. Bierkandt, E. Bugiel, T. Wietler, K. R. Hofmann
(2004):
Growth of CaF2/Si/CaF2 Resonant-Tunneling Structures by B and Sb Surfactant-Enhanced Epitaxy,
44th Electronic Materials Conference 2004, University of Notre Dame, Notre Dame, Indiana, USA, 23.-25.06.2004
-
C. R. Wang, B. H. Müller, M. Bierkandt, T. Wietler, E. Bugiel, and K. R. Hofmann
(2004):
Boron surfactant-enhanced growth of Si films on CaF2/Si,
E-MRS Spring Meeting, Strasbourg, France, 24.-28.05.2004
-
C. R. Wang, M. Bierkandt, B. H. Müller, S. Paprotta, E. Bugiel, T. Wietler, K. R. Hofmann
(2004):
Fabrication of Resonant-Tunneling Diodes by B Surfactant Modified Growth of Si Films on CaF2/Si,
DPG-Frühjahrstagung, Regensburg, Germany, 08.-12.03.2004
-
C. R. Wang, M. Bierkandt, B. H. Müller, S. Paprotta, E. Bugiel, T. Wietler, K. R. Hofmann
(2004):
Fabrication of Resonant-Tunneling Diodes by B Surfactant-Enhanced Growth of Si Quantum Well Layers on CaF2/Si,
4th IEEE Conference on Nanotechnology, Munich, Germany, 17.-19.08.2004
-
E. Bugiel
(2004):
TEM-Querschnittspräparation - einfach, schnell und preiswert,
Workshop des Fachausschusses Metallografie der Deutschen Gesellschaft für Materialkunde: Präparative Aspekte der TEM, Mai 2004
-
H.-J. Osten (invited)
(2004):
The red brick wall of traditional semiconductor electronics,
Hereaus-Seminar "Spintronic", Bad Honnef, 11.-14.01.2004
-
H.-J. Osten (invited)
(2004):
Epitaxial High-k Dielectrics on Silicon,
5th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM), Smolenice, Slovakia, 17.-21.10.2004
-
H.-J. Osten, E. Bugiel, A. Fissel, O. Kirfel (invited)
(2004):
Epitaxial Silicon/Metal Oxide Stacks for various applications,
11th Advanced Heterostructure Workshop, Hawaii, USA, 05.-10.12.2004
-
H.-J. Osten, E. Bugiel, O. Kirfel, M. Czernohorsky, A. Fissel (invited keynote lecture)
(2004):
Growth and Properties of Epitaxial Metal Oxides for High-K Dielectrics,
IC MBE 2004, Edinburgh, UK, August 2004
-
M. Tolkiehn, D. V. Novikov, C. R. Wang
(2004):
Experimente mit kinematischen stehenden Röntgenwellen an CaF2/Si(111),
DPG-Frühjahrstagung, Regensburg, Germany, 08.-12.03.2004
-
T. F. Wietler, A. Ott, E. Bugiel, K. R. Hofmann
(2004):
Advances in Growth and Device Processing of Germanium Films on Si(111),
Second International SiGe Technology and Device Meeting, Frankfurt/Oder, Germany, 16.-19.05.2004
-
T. F. Wietler, K. R. Hofmann
(2004):
XRD analysis of Ge- and GexSi1-x-layers grown by surfactant mediated epitaxy,
DPG-Frühjahrstagung, Regensburg, Germany, 08.-12.03.2004
-
A. Fissel, H.-J. Osten, and E. Bugiel (invited)
(2003):
Towards understanding epitaxial growth of alternative high-K dielectrics on Si(001): Application to Praseodymium Oxide,
Physics and Chemistry of Semiconductor Interfaces, Salt Lake City, Utah, USA, 19.-23.01.2003
-
B. H. Müller, C. R. Wang, A. Bugiel, K. R. Hofmann
(2003):
Surfactant modified epitaxy of Si on CaF2/Si(111),
DPG-Jahrestagung, Dresden, Germany, 24.-28.03.2003
-
C. Deiter, J. Wollschläger, C. R. Wang, B. H. Müller
(2003):
Surfactant Enhanced Annealing of Si Films on CaF2/Si(111) investigated by SXRD and AFM,
2003 HASYLAB Users Meeting "Research with Synchrotron Radiation", 31.01.2003
-
C. R. Wang, B. H. Müller and K. R. Hofmann
(2003):
Double-barrier resonant-tunneling diode by surfactant-assisted growth of Si on CaF2/Si,
2003 IEEE Silicon Nanoelectronics Workshop, Kyoto, Japan, 08.-09.06.2003
-
C. R. Wang, B. H. Müller, K. R. Hofmann
(2003):
High temperature growth of CaF2 on Si(111) substrates,
DPG-Jahrestagung, Dresden, Germany, 24.-28.03.2003
-
C. R. Wang, B. H. Müller, T. Wietler, E. Bugiel. K. R. Hofmann
(2003):
Surfactant enhanced growth of thin Si films on CaF2/Si(111),
2003 E-MRS Spring Meeting, Strasbourg, France, 10.-13.06.2003
-
F. Beug, R. Ferretti, K. R. Hofmann
(2003):
Detailed investigation of the transient local tunneling in gate oxides,
2003 IEEE International Reliability Physics Symposium, Dallas, Texas, USA, 30.03.-04.04.2003
-
H. Brocke
(2003):
FEM-Analyse von Viaketten in Cu-Technologie mit low-k Dielektrikum und von Viaketten in Al-Technologie bezüglich Temperatur- und Stromdichteverteilung,
E.I.S. Workshop, Erlangen, 31.03.-01.04.2003
-
H.-J. Osten (invited)
(2003):
Growth, properties, and application of ternary SiGeC alloys on Si,
Keynote lecture at the III. Ibero American Workshop on Nanostructures for Application in Micro and Optoelectronic, Madrid, Spain, 24.-28.03.2003
-
H.-J. Osten (invited)
(2003):
Epitaxial high-K materials as future gate dielectrics,
HeTech03, San Rafael, Segovia, 12.-15.10.2003
-
H.-J. Osten, A. Bugiel, A. Fissel (invited)
(2003):
Understanding epitaxial growth of alternative high-K dielectrics on Si(001),
ESF Workshop, Zürich, Switzerland, 17.-18.03.2003
-
H.-J. Osten, A. Fissel (invited)
(2003):
Epitaxial High-K Materials,
12th EURO-MBE 2002, Bad Hofgastein, Austria, 16.-19.02.2003
-
O. Aubel, W. Hasse, M. Hommel
(2003):
Bimodal behavior and improvement of electromigration resistance of copper observed in highly accelerated lifetime tests (HALT),
Advanced Metallizations Conference, Montreal, Canada, 21.-23.10.2003
-
S. E. Schulz, O. Aubel, J. Baumann, W. Hasse, T. Gessner
(2003):
Copper Alloys for Improved Interconnect Properties,
Poster Presentation at Advanced Metallizations Conference, Montreal, Canada, 21.-23.10.2003
-
T. Wietler, N. Hoffmann, E. Bugiel, K. R. Hofmann
(2003):
Growth and characterisation of Ge- and GexSi1-x-multilayers on virtual GeSi-substrates,
DPG-Frühjahrstagung, Dresden, Germany, 24.-28.03.2003
-
X. Yu, O. Aubel, W. Hasse
(2003):
Simulation of electrical, thermal and mechanical effects on migration performance and voids formation in a complete copper dual damascene test structure with the influence of the extrusion monitor,
Advanced Metallizations Conference, Montreal, Canada, 21.-23.10.2003
-
B. H. Müller, C. Wang, K. R. Hofmann
(2002):
Fabrication and I-V measurements of CaF2/Si/CaF2 resonant tunnelling diodes,
DPG-Tagung 2002, Regensburg, Germany, March 11.-15.03.2002
-
B. H. Müller, C. Wang, K. R. Hofmann
(2002):
MBE growth of thin Si films on CaF2/Si(111) for resonant tunnelling structures,
E-MRS 2002 Spring Meeting, Symposium J, Strasbourg, France, 18.-21.06.2002
-
B. H. Müller, C. Wang, K. R. Hofmann
(2002):
Growth of CaF2/Si/CaF2 Resonant-Tunneling Structures,
43rd Electronic Materials Conference 2002, University of California, Santa Barbara, California, USA, 26.-28.06.2002
-
B. Müller, C. Wang, K. R. Hofmann
(2002):
Topographische und elektrische Charakterisierung von Si/CaF2-Heteroschichtfolgen auf Si(111),
DPG-Tagung 2002, Regensburg, Germany, March 11.-15.03.2002
-
C. Wang, B. H. Müller, K. R. Hofmann
(2002):
CaF2/Si/CaF2 Double-Barrier Resonant Tunneling Diodes on Silicon,
IEEE 2002 Silicon Nanoelectronics Workshop, Honolulu, Hawaii, USA, 09.-10.06.2002
-
C. Wang, B. H. Müller, K. R. Hofmann
(2002):
Friction force material contrast during the initial stage of CaF2/Si(111) epitaxy,
21st European Conference on Surface Science, Malmö, Sweden, 24.-28.06.2002
-
F. Bechstedt, A. Fissel, J. Furthmüller, U. Kaiser, H.-C. Weisker, W. Wesch (invited)
(2002):
Quantum structures in SiC,
11. Conference on Formation of Interfaces (ICSFS-11), Marseille, France, 08.-12.07.2002
-
H.-J. Osten (invited)
(2002):
SiGe:C Device Application,
201st ECS Meeting, 9th International Symposium on Silicon Material Science and Technology, Philadelphia, 12.-17.05.2002
-
H.-J. Osten, E. Bugiel, A. Fissel
(2002):
Epitaxial Praseodymium Oxide: A New High-K Dielectric,
9th International Workshop on Oxide Electronics (WOE), St. Peter Beach, Florida, Oct. 2002
-
H.-J. Osten, E. Bugiel, A. Fissel (invited)
(2002):
Epitaxial Praseodymium Oxide: A New High-K Dielectric,
Material Research Society, Fall Meeting, Symp. M, Boston, 02.-05.12.2002
-
I. Dumkow, T. Wietler, K. R. Hofmann, M. Horn-von Hoegen
(2002):
Germanium auf relaxierten Ge0.8Si0.2 Pseudosubstraten Präparation und Morphologie,
DPG-Tagung 2002, Regensburg, Germany, March 11.-15.03.2002
-
S. Paprotta, F. Beug, T. Wietler, R. Ferretti, K. R. Hofmann
(2002):
Characterization of Gate-Stacks with Silicon and Germanium Nano-Crystals for Memory Application,
International Workshop NEOP, 7, Dresden, Germany, 07.-09.10.2002
-
S. Paprotta, R. Ferretti, K. R. Hofmann, J. D. Kähler
(2002):
Characterization of LPCVD-SiO2 and ONO-Stacks using BTBAS as Precursor,
5th International Meeting of CREMSI, STUniversity, Fuveau, France, 14.-15.11.2002
-
T. Wietler, N. Hoffmann, K. R. Hofmann
(2002):
Untersuchung dünner GexSi1-x-Pseudosubstrate auf Silizium,
DPG-Tagung 2002, Regensburg, Germany, March 11.-15.03.2002
-
U. Schwalke, K. Boye, K. Haberle, R. Heller, G. Hess, G. Müller, T. Ruland. G. Tzschöckel, H. J. Osten, A. Fissel, H.-J. Müssig (invited)
(2002):
High-k dielectric materials: Integration issues and electrical characteristics,
European Congress on Advanced Materials and Processes, Materials Week 2002, München, Germany, 30.09.–02.10.2002
-
U. Schwalke, K. Boye, K. Haberle, R. Heller, G. Hess, G. Müller, T. Ruland. G. Tzschöckel, H.-J. Osten, A. Fissel, H. J. Müssig (invited)
(2002):
Process Integration of Crystalline Pr2O3 High-K Gate Dielectrics,
32th European Solid-State Device Research Conference (ESSDERC 2002), Firenze, Italy, 24.-26.09.2002
-
W. Hasse, H. Brocke, X. Yu
(2002):
FEM-Simulation von Metallisierungsstrukturen bei hohen Stromdichten,
20. ITG-Diskussionssitzung "Fehlermechanismen bei kleinen Geometrien", Oberammergau, Germany, 07.-08.05.2002
-
B. H. Müller, C. Wang, K. R. Hofmann
(2001):
Morphologies of CaF2 films grown by MBE on Si(111) substrates,
DPG-Tagung 2001, Hamburg, Germany, 26.-30.03.2001
-
C. R. Wang, B. H. Müller, K. R. Hofmann
(2001):
Molecular Beam Epitaxy of CaF2 on Si(111),
42nd Electronic Materials Conference 2001, Notre Dame, Indiana, USA, 27.-29.06.2001
-
T. Wietler, N. Hoffmann, K. R. Hofmann
(2001):
Herstellung von GexSi1-x-Schichten auf Si-Substraten mittels Surfactant Modifizierter Epitaxie,
DPG-Tagung 2001, Hamburg, Germany, 26.-30.03.2001
-
A. Klust, M. Bierkandt, T. Hildebrandt, R. Kayser, J. Wollschläger, T. Schmidt, J. Falta, B. H. Müller
(2000):
Wachstum von Halbleitern auf CaF2/Si(111),
DPG-Frühjahrstagung 2000, Regensburg, Germany, 27.-31.04.2000
-
C. Wang, B. H. Müller, K. R. Hofmann
(2000):
Electronic and structural characterization of MBE CaF2 epilayers on Si(111) substrates,
DPG-Frühjahrstagung 2000, Regensburg, Germany, 27.-31.04.2000
-
J. Wollschläger, M. Bierkandt, M. Grimsehl, A. Klust, T. Schmidt, J. Falta, B. H. Müller, K. R. Hofmann
(2000):
Struktur der CaF2/Si(111)-Grenzfläche,
DPG-Frühjahrstagung 2000, Regensburg, Germany, 27.-31.04.2000
-
N. Hoffmann, T. Wietler, M. Kammler, D. Reinking, K. R. Hofmann, M. Horn-von Hoegen
(2000):
Surfactant modifizierte Epitaxie: Herstellung und elektrische Charakterisierung eines Ge-p-Kanal-MOSFETs auf Si-Substrat,
DPG-Frühjahrstagung 2000, Regensburg, Germany, 27.-31.04.2000
-
B. H. Müller, K. R. Hofmann
(1999):
Heteroepitaktische CoSi2/CaF2 Strukturen auf Si
-
M. Horn-von Hoegen, P. Kury, M. Kammler, B. H. Müller, T. Schmidt, J. Falta
(1999):
Reciprocal Space Mapping periodischer Versetzungsnetzwerke,
DPG Frühjahrstagung 1999, Freiburg i. Br., Germany, 22.-26.04.1999
-
M. Kammler, K. R. Hofmann, A. A. AlFalou, M. Horn-von Hoegen
(1999):
Surfactant modifizierte Epitaxie von relaxierten Ge1-xSix/Si-Filmen auf Si,
DPG Frühjahrstagung 1999, Freiburg i. Br., Germany, 22.-26.04.1999